公开(公告)号：US20160194451A1

公开(公告)日：2016-07-07

申请号：US14652672

申请日：2013-12-19

Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.

Inventor： Naofumi YOSHIDA ,  Yuji TASHIRO ,  Daishi YOKOYAMA ,  Toshiaki NONAKA

IPC: C08G77/04 ,  C09D183/04 ,  C08G77/08

CPC classification number: C08G77/04 ,  C08G77/045 ,  C08G77/08 ,  C08G77/16 ,  C08K3/36 ,  C08K2201/011 ,  C09D183/04 ,  C08L83/04

Abstract: [Problem] An object of the present invention is to provide a composite of silicon oxide nanoparticles and a silsesquioxane polymer, from which a cured film having a low refractive index can be formed inexpensively.[Means for Solution] Provided are a method of producing a composite of silicon oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal or a silane monomer with silicon oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in a mixed solvent of an aqueous solvent and an organic solvent in the presence of a phase transfer catalyst, and a composite produced by the method.

Abstract translation: 发明内容本发明的目的是提供一种二氧化硅纳米粒子和倍半硅氧烷聚合物的复合体，能够廉价地形成低折射率的固化膜。 [解决方案]提供一种生产氧化硅纳米粒子和倍半硅氧烷聚合物的复合体的方法，该方法包括使末端具有硅烷醇基的硅倍半硅氧烷聚合物或硅烷单体与具有羟基的氧化硅纳米粒子或 在相转移催化剂存在下，在水性溶剂和有机溶剂的混合溶剂中的表面上的烷氧基和通过该方法制备的复合材料。

公开(公告)号：US20160266490A1

公开(公告)日：2016-09-15

申请号：US15031668

申请日：2014-10-14

Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.

Inventor： Naofumi YOSHIDA ,  Yuji TASHIRO

IPC: G03F7/075 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16

CPC classification number: G03F7/0757 ,  C08G77/52 ,  C08L83/14 ,  C09D183/14 ,  G03F7/162 ,  G03F7/20 ,  G03F7/30 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: A heat- or photo-curable composition comprising: a polysiloxane which is produced by reacting a silicon compound (i) represented by the formula: R1nSi (X) 4-. (wherein R1 represents an alkyl group, an aryl group or the like; X represents a chlorine atom or an alkoxy group; and n represents 0 to 2) with a silicon compound (ii) represented by the formula (b) or (c) (wherein R2 to R7 independently represent an alkyl group or the like; M1 and M2 independently represent an arylene group, an alkylene group or the like; and Y1 to Y6 independently represent a chlorine atom or an alkoxy group) in the presence of an alkali catalyst or an acid catalyst; a polymerization initiator which enables the generation of an acid or a base by the action of heat or light; and a solvent. The composition enables the formation of a thick film. When the composition is coated onto a substrate, is then heated or exposed to light, is then developed if necessary, and is then heated and cured at a low temperature, a cured film can be formed.