公开(公告)号：US20130043414A1

公开(公告)日：2013-02-21

申请号：US13397703

申请日：2012-02-16

Applicant: Alon ROSENTHAL

Inventor： Alon ROSENTHAL

IPC: H05K9/00 ,  G21K5/00

CPC classification number: G03F7/70858 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  H01J37/09 ,  H01J37/1475 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31793 ,  H01L21/6719 ,  H01L21/67213

Abstract: The invention relates to a system for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber and a set of two coils. The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.

Abstract translation: 本发明涉及一种用于磁屏蔽带电粒子光刻设备的系统。 该系统包括第一室，第二室和一组两个盘管。 第一室具有包括磁屏蔽材料的壁，并且至少部分地包围带电粒子光刻设备。 第二室还具有包括磁屏蔽材料的壁，并且包围第一室。 该组两个线圈被布置在第二腔室中的第一腔室的相对侧上。 两个线圈具有公共轴。