公开(公告)号：US10054785B1

公开(公告)日：2018-08-21

申请号：US14980872

申请日：2015-12-28

Applicant: Amazon Technologies, Inc.

Inventor： Iren Fischer ,  Romaric Mathieu Massard ,  Gerben Boon ,  Bokke Johannes Feenstra

IPC: G02B26/00 ,  G02B1/04 ,  G03F7/20

CPC classification number: G02B26/005 ,  G02B1/04 ,  G02B2207/115 ,  G03F7/20

Abstract: An electrowetting element comprises a first fluid and a second fluid immiscible with the first fluid. A first support plate comprises a first substrate; an electrode; and a layer in contact with at least one of the first fluid or the second fluid. A second support plate comprises a second substrate. One of the first support plate or the second support plate comprises a resist structure protruding in a direction towards the other one of the first support plate or the second support plate. The resist structure comprises a polymer nanocomposite material.