Enclosure system shelf including alignment features

    公开(公告)号:US12027397B2

    公开(公告)日:2024-07-02

    申请号:US17206036

    申请日:2021-03-18

    CPC classification number: H01L21/67383

    Abstract: A set of one or more shelves is configured to be disposed within an enclosure system of a substrate processing system. The set of one or more shelves includes first upper surfaces disposed substantially in a first plane, carrier alignment features configured to align a carrier on the first upper surfaces, second upper surfaces disposed substantially in a second plane that is above the first plane, and process kit ring alignment features configured to align a process kit ring on the carrier above the second upper surfaces.

    ENCLOSURE SYSTEM SHELF
    4.
    发明申请

    公开(公告)号:US20240429079A1

    公开(公告)日:2024-12-26

    申请号:US18759704

    申请日:2024-06-28

    Abstract: A shelf system includes a first distal portion configured to be fastened to a first surface of an enclosure system. The first distal portion includes a first carrier alignment feature and a first process kit ring alignment feature. The shelf system further includes a second distal portion configured to be fastened to a second surface of the enclosure system. The second distal portion includes a second carrier alignment feature and a second process kit ring alignment feature. The first carrier alignment feature and the second carrier alignment feature are configured to be disposed proximate outer surfaces of a carrier to align the carrier in the enclosure system. The first process kit ring alignment feature and the second process kit ring alignment feature are configured to be proximate inner surfaces of a process kit ring to align the process kit ring on the carrier in the enclosure system.

    ENCLOSURE SYSTEM SHELF
    6.
    发明申请

    公开(公告)号:US20210296149A1

    公开(公告)日:2021-09-23

    申请号:US17206036

    申请日:2021-03-18

    Abstract: A set of one or more shelves is configured to be disposed within an enclosure system of a substrate processing system. The set of one or more shelves includes first upper surfaces disposed substantially in a first plane, carrier alignment features configured to align a carrier on the first upper surfaces, second upper surfaces disposed substantially in a second plane that is above the first plane, and process kit ring alignment features configured to align a process kit ring on the carrier above the second upper surfaces.

    SUBSTRATE PROCESSING SYSTEM CARRIER

    公开(公告)号:US20210292104A1

    公开(公告)日:2021-09-23

    申请号:US17205878

    申请日:2021-03-18

    Abstract: A carrier includes a rigid body forming a plurality of openings and a plurality of fasteners configured to removably attach to the rigid body via the plurality of openings. A first set of fingers is configured to be removably attached to the rigid body via the plurality of fasteners and the plurality of openings. The first set of fingers is configured to support first content during first transportation of the carrier within a substrate processing system. A second set of fingers is configured to be removably attached to the rigid body via the plurality of fasteners and the plurality of openings. The second set of fingers is configured to support second content during second transportation of the carrier within the substrate processing system.

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