公开(公告)号：US20240088873A1

公开(公告)日：2024-03-14

申请号：US17941976

申请日：2022-09-09

Applicant: Applied Materials, Inc.

Inventor： DAVID COUMOU ,  DENNIS BROWN

IPC: H03H11/28 ,  H01J37/32

CPC classification number: H03H11/28 ,  H01J37/32183 ,  H01J2237/327

Abstract: Embodiments disclosed herein include an impedance matching network. In an embodiment, the impedance matching network comprises an input, and a first matrix tuning element on a first branch from the input, where the first matrix tuning element comprises a variable capacitance. In an embodiment, the impedance matching network further comprises a transformer on a second branch from the input, where the transformer has at least a first tap, where a second matrix tuning element is on the first tap, and where the second matrix tuning element comprises a variable capacitance. In an embodiment, the impedance matching network further comprises a third matrix tuning element after the transformer on the second branch, where the third matrix tuning element comprises a variable capacitance. In an embodiment, the impedance matching network further comprises an output after the third matrix tuning element on the second branch.

公开(公告)号：US20250095965A1

公开(公告)日：2025-03-20

申请号：US18967465

申请日：2024-12-03

Applicant: Applied Materials, Inc.

Inventor： DAVID COUMOU ,  NATHAN RANSOM ,  PRIYA GAMBHIRE ,  JEREMY ZUCH ,  SENTHIL KUMAR VADIVELU

IPC: H01J37/32

Abstract: Embodiments disclosed herein include a method for field adjusting calibrating factors of a plurality of RF impedance matches for control of a plurality of plasma chambers. In an embodiment, the method comprises collecting and storing in a memory data from operation of the plurality of RF impedance matches, and finding a tune space for each of the plurality of RF impedance matches from the collected data. In an embodiment, the method further comprises finding adjustments to account for variability in each of the plurality of RF impedance matches, finding adjustments to variable tuning elements of the plurality of RF impedance matches to account for time varying and process related load impedances, and the method further comprises obtaining operating windows for the variable tuning elements in the plurality of RF impedance matches.

公开(公告)号：US20250079124A1

公开(公告)日：2025-03-06

申请号：US18954202

申请日：2024-11-20

Applicant: Applied Materials, Inc.

Inventor： DAVID COUMOU

IPC: H01J37/32 ,  G01R19/00 ,  H03H7/40

Abstract: Embodiments disclosed herein include a processing tool. In an embodiment, the processing tool comprises a power supply, an impedance matching network coupled to the power supply, a cathode, wherein the power supply is configured to supply power through the impedance matching network to the cathode, and a processing module, wherein the processing module is communicatively coupled to the power supply and the impedance matching network.