公开(公告)号：US20200051797A1

公开(公告)日：2020-02-13

申请号：US16536641

申请日：2019-08-09

Applicant: Applied Materials, Inc.

Inventor： Sanjay Bhat ,  Vibhu Jindal ,  Kamatchigobinath Manoharan

IPC: H01J37/34 ,  C23C14/34 ,  C23C14/14

Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising one or more of contours that reduce particle defects, temperature control and or measurement and and/or voltage particle traps to reduce processing defects.

公开(公告)号：US11387085B2

公开(公告)日：2022-07-12

申请号：US16536641

申请日：2019-08-09

Applicant: Applied Materials, Inc.

Inventor： Sanjay Bhat ,  Vibhu Jindal ,  Kamatchigobinath Manoharan

IPC: H01J37/34 ,  C23C14/34 ,  C23C14/14

Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising one or more of contours that reduce particle defects, temperature control and or measurement and and/or voltage particle traps to reduce processing defects.