公开(公告)号：US12136544B2

公开(公告)日：2024-11-05

申请号：US17865144

申请日：2022-07-14

Applicant: Applied Materials, Inc.

Inventor： Anthony Chih-Tung Chan ,  Adolph Miller Allen ,  Mehul Chauhan ,  Goichi Yoshidome

IPC: H01J37/34 ,  C23C14/35

Abstract: Methods and apparatus for generating a magnetic field external to a physical vapor deposition (PVD) chamber to improve etch or deposition uniformity on a substrate disposed inside of the PVD chamber are provided herein. In some embodiments, a process chamber, includes a chamber body defining an interior volume therein; a pedestal disposed in the interior volume for supporting a substrate; a coil disposed in the interior volume above the pedestal; and an external magnet assembly, comprising: a housing coupled to the chamber body; and a plurality of magnets disposed external to the chamber body coupled to the housing and arranged asymmetrically about the chamber body.