公开(公告)号：USD1045924S1

公开(公告)日：2024-10-08

申请号：US29907881

申请日：2024-01-09

Applicant: Applied Materials, Inc.

Designer： Sidharth Bhatia ,  Zhaozhao Zhu ,  Jeffrey Yat Shan Au ,  Shawn Levesque ,  Michael Howells ,  Raja Sekhar Jetti

Abstract: FIG. 1 is a front view of a first image in a sequence of a portion of a display panel with a graphical user interface; and,
FIG. 2 is a second image thereof.
The broken line showing of various regions of a graphical user interface in each of the views form no part of the claimed design. The broken line showing of the display screen is for illustrative purposes only and forms no part of the claimed design.
The appearance of the transitional image sequentially transitions between the images shown in FIGS. 1-2. The process or period in which one image transitions to another image forms no part of the claimed design.

公开(公告)号：US20230297072A1

公开(公告)日：2023-09-21

申请号：US17695058

申请日：2022-03-15

Applicant: APPLIED MATERIALS, INC.

Inventor： Michael Howells ,  Thorsten Kril ,  Hemanth Konanur Nagendra ,  Jatinder Sasan

IPC: G05B19/4155 ,  G05B19/18

CPC classification number: G05B19/4155 ,  G05B19/182 ,  G05B2219/24015

Abstract: An electronic device manufacturing system that includes a process tool and a tool server coupled to the process tool and comprising a communication node and an evaluation system. The communication node is configured to obtain one or more attributes from an evaluation system and provide a monitoring device comprising a data collection plan that is based on the one or more attributes. The communication node is further configured to register the monitoring device with a process tool. The communication node is further configured to receive, from the process tool, data based on the data collection plan and send the received data to the evaluation system.

公开(公告)号：US20240176334A1

公开(公告)日：2024-05-30

申请号：US18070453

申请日：2022-11-28

Applicant: Applied Materials, Inc.

Inventor： Sidharth Bhatia ,  Roger Lindley ,  Upendra Ummethala ,  Thomas Li ,  Michael Howells ,  Steven Babayan ,  Mimi-Diemmy Dao

IPC: G05B19/418

CPC classification number: G05B19/41865 ,  G05B19/4188 ,  G05B19/41885 ,  G05B2219/45031

Abstract: A method includes receiving, by a processing device, first trace data associated with a first processing chamber, wherein the first processing chamber satisfies one or more performance metrics. The method further includes generating target trace data based on the first trace data associated with the first processing chamber. The method further includes receiving second trace data associated with a second processing chamber, wherein the second processing chamber does not satisfy the one or more performance metrics. The method further includes generating, based on the target trace data and the second trace data, a first recommended corrective action associated with the second processing chamber, wherein the first recommended corrective action includes updating one or more equipment constants of the second processing chamber. The method further includes performing the first recommended corrective action.

公开(公告)号：US20240176312A1

公开(公告)日：2024-05-30

申请号：US18070448

申请日：2022-11-28

Applicant: Applied Materials, Inc.

Inventor： Sidharth Bhatia ,  Roger Lindley ,  Upendra Ummethala ,  Thomas Li ,  Michael Howells ,  Steven Babayan ,  Mimi-Diemmy Dao

IPC: G05B13/02 ,  G05B13/04

CPC classification number: G05B13/027 ,  G05B13/048

Abstract: A method includes providing, as input to a first trained machine learning model, trace data associated with one or more substrate processing procedures. The input further includes equipment constants associated with the one or more substrate processing procedures. The input further includes trace data of a first processing chamber. The input further includes equipment constants of the first processing chamber. The method further includes obtaining, as output from the first trained machine learning model, a recommended update to a first equipment constant of the first processing chamber. The method further includes updated the first equipment constant of the first processing chamber responsive to obtaining the output from the first trained machine learning model.

公开(公告)号：US20240419151A1

公开(公告)日：2024-12-19

申请号：US18820610

申请日：2024-08-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Michael Howells ,  Thorsten Kril ,  Hemanth Konanur Nagendra ,  Jatinder Sasan

IPC: G05B19/4155 ,  G05B19/18

Abstract: An electronic device manufacturing system that includes a process tool, an evaluation system, and a communication node. The communication node is configured to obtain one or more attributes from the evaluation system and identify a data collection plan that is based on the one or more attributes. The communication node is further configured to register with the process tool to receive data according to the data collection plan and receive, from the process tool, data according to the data collection plan. The communication node is further configured to send the received data to the evaluation system.

公开(公告)号：USD1045923S1

公开(公告)日：2024-10-08

申请号：US29907878

申请日：2024-01-09

Applicant: Applied Materials, Inc.

Designer： Sidharth Bhatia ,  Zhaozhao Zhu ,  Jeffrey Yat Shan Au ,  Shawn Levesque ,  Michael Howells ,  Raja Sekhar Jetti

Abstract: FIG. 1 is a front view of a first image in a sequence of a portion of a display panel with a graphical user interface; and,
FIG. 2 is a second image thereof.
The broken line showing of various regions of a graphical user interface in each of the views form no part of the claimed design. The broken line showing of the display screen is for illustrative purposes only and forms no part of the claimed design.
The appearance of the transitional image sequentially transitions between the images shown in FIGS. 1-2. The process or period in which one image transitions to another image forms no part of the claimed design.

公开(公告)号：US11892821B2

公开(公告)日：2024-02-06

申请号：US17695058

申请日：2022-03-15

Applicant: APPLIED MATERIALS, INC.

Inventor： Michael Howells ,  Thorsten Kril ,  Hemanth Konanur Nagendra ,  Jatinder Sasan

IPC: G05B19/18 ,  G05B19/4155

CPC classification number: G05B19/4155 ,  G05B19/182 ,  G05B2219/24015

Abstract: An electronic device manufacturing system that includes a process tool and a tool server coupled to the process tool and comprising a communication node and an evaluation system. The communication node is configured to obtain one or more attributes from an evaluation system and provide a monitoring device comprising a data collection plan that is based on the one or more attributes. The communication node is further configured to register the monitoring device with a process tool. The communication node is further configured to receive, from the process tool, data based on the data collection plan and send the received data to the evaluation system.

公开(公告)号：USD1031743S1

公开(公告)日：2024-06-18

申请号：US29837666

申请日：2022-05-06

Applicant: Applied Materials, Inc.

Designer： Sidharth Bhatia ,  Zhaozhao Zhu ,  Jeffrey Yat Shan Au ,  Shawn Levesque ,  Michael Howells ,  Raja Sekhar Jetti

Abstract: FIG. 1 is a front view of a first image in a sequence of a portion of a display panel with a graphical user interface; and,
FIG. 2 is a second image thereof.
The appearance of the transitional image sequentially transitions between the images shown in FIGS. 1-2. The process or period in which one image transitions to another image forms no part of the claimed design.

公开(公告)号：US20240176336A1

公开(公告)日：2024-05-30

申请号：US18070456

申请日：2022-11-28

Applicant: Applied Materials, Inc.

Inventor： Sidharth Bhatia ,  Roger Lindley ,  Upendra Ummethala ,  Thomas Li ,  Michael Howells ,  Steven Babayan ,  Mimi-Diemmy Dao

IPC: G05B19/418

CPC classification number: G05B19/41875 ,  G05B2219/32368

Abstract: A method includes receiving, by a processing device, data indicative of performance of a plurality of process chambers. The method further includes providing the data indicative of performance of the plurality of process chambers to a model. The method further includes receiving as output from the model a first recommended equipment constant update associated with a first process chamber of the plurality of process chambers and a second recommended equipment constant update associated with a second process chamber of the plurality of process chambers. The method further includes updating a first equipment constant of the first process chamber and a second equipment constant of the second process chamber in view of the first recommended equipment constant update and the second recommended equipment constant update.

公开(公告)号：US20240176328A1

公开(公告)日：2024-05-30

申请号：US18432525

申请日：2024-02-05

Applicant: APPLIED MATERIALS, INC.

Inventor： Michael Howells ,  Thorsten Kril ,  Hemanth Konanur Nagendra ,  Jatinder Sasan

IPC: G05B19/4155 ,  G05B19/18

CPC classification number: G05B19/4155 ,  G05B19/182 ,  G05B2219/24015

Abstract: An electronic device manufacturing system that includes a process tool and a tool server coupled to the process tool and comprising a communication node and an evaluation system. The communication node is configured to receive, from a monitoring device registered on the process tool, data based on a data collection plan and send the received data to the evaluation system. The communication node is further configured to receive, from the evaluation system, feedback data based on the received data and cause the process tool to perform a corrective action based on the feedback data.