-
公开(公告)号：US10211030B2
公开(公告)日：2019-02-19
申请号：US15104461
申请日：2015-06-15
Applicant: Applied Materials, Inc.
Inventor： Rongping Wang , Ruizhe Ren , Jon C. Farr , Chethan Mangalore , Peter Demonte , Parthiban Balakrishna
Abstract: Embodiments of the present disclosure include a radial frequency plasma source having a split type inner coil assembly. In one embodiment, the split type inner coil assembly comprises two intertwining coils. In another embodiment, the split type inner coil assembly includes looped coils forming a dome.
Search Results
1
records
(took 0.011 seconds)
筛选
AND
AND
过滤
NOT
NOT
Scan to Join
