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公开(公告)号：US20240102215A1
公开(公告)日：2024-03-28
申请号：US18264021
申请日：2022-02-02
Applicant: Applied Silver, Inc.
Inventor： Priya Balachandran , Elizabeth Ann Hutt Pollard , Sean D. Morham , Seth Donrovich
IPC: D04H1/4291 , C11D3/48 , D04H1/4334 , D04H1/435 , D06M11/83 , D06M13/46 , D06M16/00
CPC classification number: D04H1/4291 , C11D3/48 , D04H1/4334 , D04H1/435 , D06M11/83 , D06M13/46 , D06M16/00 , C11D2111/12
Abstract: In one aspect, an example article for treating a textile with an antimicrobial agent includes: (a) a nonwoven multicomponent sheet, wherein the nonwoven multicomponent sheet comprises at least two materials; and (b) an antimicrobial agent comprising at least one of a metal ion or quaternary ammonium compound having antimicrobial activity, wherein an efficacious amount of at least one of the metal ion or quaternary ammonium compound transfers to the textile during a laundry cycle.
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公开(公告)号：US10000881B2
公开(公告)日：2018-06-19
申请号：US14460262
申请日：2014-08-14
Applicant: Applied Silver, Inc.
Inventor： William M. Morris , Sean D. Morham , David E. Brown , Keith S. Copenhagen , Thomas B. Brezoczky
Abstract: An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.
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公开(公告)号：US20230347000A1
公开(公告)日：2023-11-02
申请号：US17800657
申请日：2021-02-22
Applicant: Applied Silver, Inc.
Inventor： Austin Carey , Brandon Chadwell , Priya Balachandran , Elizabeth Hutt Pollard , Sean D. Morham
CPC classification number: A61L2/18 , A61L2/24 , A61L2202/11 , A61L2202/15 , A61L2202/16 , A61L2202/14 , A61L2202/26 , A61L2101/26
Abstract: A method for using a portable antimicrobial treatment system is provided. The method comprises: (i) providing water to a dilution reservoir, wherein a first flow controller controls a rate of flow of the water between a water supply and the dilution reservoir, (ii) providing a high ion concentrate to the dilution reservoir, wherein a dosing pump controls a flow rate of the ion concentrate between the metallic ion cartridge and the dilution reservoir; (iii) combining the water and the high ion concentrate into a diluted solution: (iv) providing the diluted solution to at least one application system, wherein a second flow controller control a rate of flow of the diluted solution between the dilution reservoir and the at least one application system; and (v) controlling, by an electronics control module, the first flow controller, the dosing pump, and the second flow controller.
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公开(公告)号：US20190003105A1
公开(公告)日：2019-01-03
申请号：US16127187
申请日：2018-09-10
Applicant: APPLIED SILVER, INC.
Inventor： Sean D. Morham , William M. Morris , David E. Brown , Keith S. Copenhagen , Thomas B. Brezoczky
Abstract: An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.
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公开(公告)号：US20210054556A1
公开(公告)日：2021-02-25
申请号：US17016859
申请日：2020-09-10
Applicant: Applied Silver, Inc.
Inventor： Sean D. Morham , William M. Morris , David E. Brown , Keith S. Copenhagen , Thomas B. Brezoczky
Abstract: An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.
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Patent Agency Ranking
公开(公告)号：US10774460B2
公开(公告)日：2020-09-15
申请号：US16127187
申请日：2018-09-10
Applicant: APPLIED SILVER, INC.
Inventor： Sean D. Morham , William M. Morris , David E. Brown , Keith S. Copenhagen , Thomas B. Brezoczky
IPC: A61L9/00 , A61L2/00 , B08B3/00 , D06F39/02 , B05D1/18 , A01N59/16 , D06M23/10 , B05D5/00 , D06F35/00
Abstract: An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.
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公开(公告)号：US20180010288A1
公开(公告)日：2018-01-11
申请号：US15629282
申请日：2017-06-21
Applicant: APPLIED SILVER, INC.
Inventor： Sean D. Morham , William M. Morris , David E. Brown , Keith S. Copenhagen , Thomas B. Brezoczky
Abstract: An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.
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公开(公告)号：US10087568B2
公开(公告)日：2018-10-02
申请号：US15629282
申请日：2017-06-21
Applicant: APPLIED SILVER, INC.
Inventor： Sean D. Morham , William M. Morris , David E. Brown , Keith S. Copenhagen , Thomas B. Brezoczky
Abstract: An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.
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公开(公告)号：US09689106B2
公开(公告)日：2017-06-27
申请号：US14460287
申请日：2014-08-14
Applicant: Applied Silver, Inc.
Inventor： Sean D. Morham , William M. Morris , David E. Brown , Keith S. Copenhagen , Thomas B. Brezoczky
Abstract: An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.
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公开(公告)号：US20150159314A1
公开(公告)日：2015-06-11
申请号：US14460287
申请日：2014-08-14
Applicant: Applied Silver, Inc.
Inventor： Sean D. Morham , William M. Morris , David E. Brown , Keith S. Copenhagen , Thomas B. Brezoczky
Abstract: An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.
Abstract translation: 抗微生物供应系统采用工艺水供应，并且结合了与过程供水相连的金属离子供应，以向输出提供高离子浓缩物。 稀释储存器连接到金属离子供应输出端，并具有来自工艺供水的输入。 泵连接到储存器的输出端。 连接到泵的歧管为至少一个洗涤系统提供稀释的浓缩物。 电子控制模块连接到过程供水和金属离子供应之间的第一流量控制器，并且在金属离子供应和储存器之间的第二流量控制器用于建立所需金属离子浓度的稀释控制。
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