公开(公告)号：US20200347503A1

公开(公告)日：2020-11-05

申请号：US16762717

申请日：2018-11-19

Applicant: BASF SE

Inventor： Nadine ENGELHARDT ,  Dieter MAYER ,  Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET ,  Lucas Benjamin HENDERSON

IPC: C25D3/18 ,  C25D7/12

Abstract: A cobalt electrodeposition composition comprising cobalt ions, and particular leveling agents comprising X1—CO—O—R11, X1—SO2—O—R11, X1—PO(OR11)2, X1—SO—O—R11 functional groups, wherein X1 is a divalent group selected from (i) a chemical bond (ii) aryl, (iii) C1 to C12 alkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group —X11—X12—, (v) an alkylaryl group —X12—X11—, and (vi) —(O—C2H3R12)mO—, R11 is selected from H and C1 to C4 alkyl. R12 is selected from H and C1 to C4 alkyl, X12 is a divalent aryl group, X11 is a divalent C1 to C15 alkandiyl group.

公开(公告)号：US20230134713A1

公开(公告)日：2023-05-04

申请号：US17913179

申请日：2021-03-24

Applicant: BASF SE

Inventor： Miran YU ,  Guenter SCHERR ,  Marco ARNOLD ,  Dieter MAYER ,  Madhura Shreekar PAWAR

IPC: C08G59/40 ,  C08G59/62 ,  C08G59/32 ,  C08L63/00

Abstract: The present invention relates to a resin composition, comprising (a) an epoxy resin; (b) a curing agent comprising the structure of formula C1; (c) an inorganic filler; wherein RC1 is (a) a siloxane group of formula C1a or (b) or both a siloxane group of formula C1a and an ester group of formula C1b; RC2 is selected from a bulky C4 to C12 alkyl group comprising at least one tertiary or quaternary carbon atom; RC11, RC12, RC13 are independently selected from methyl, ethyl and 1-propyl; RC14 is selected from a linear or branched C1 to C8 alkyl; XC1 is selected from a divalent C1 to C4 alkanediyl group; and n is an average number of repeating units and is from 1.05 to 200.

公开(公告)号：US20200185224A1

公开(公告)日：2020-06-11

申请号：US16638318

申请日：2018-08-31

Applicant: BASF SE

Inventor： Marcel Patrik KIENLE ,  Cornelia ROEGER-GOEPFERT ,  Dieter MAYER ,  Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET

IPC: H01L21/288 ,  C25D5/02 ,  C25D3/38 ,  C25D7/12

Abstract: A composition for metal plating comprising a source of metal ions and at least one leveling agent comprising at least one polyaminoamide comprising a polymer fragment of formula (I) or derivatives thereof obtainable by complete or partial protonation or N-quarternisation.

公开(公告)号：US20190226107A1

公开(公告)日：2019-07-25

申请号：US16318540

申请日：2017-07-06

Applicant: BASF SE

Inventor： Marcel Patrik KIENLE ,  Dieter MAYER ,  Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET

IPC: C25D3/16 ,  C25D7/12 ,  C25D3/18 ,  H01L21/288 ,  H01L21/768 ,  H01L23/532 ,  H01L23/522

Abstract: A composition comprising: (a) cobalt ions, and (b) an additive of formula (I) wherein R1 is selected from X-Y; R2 is selected from R1 and R3; X is selected from linear or branched C1 to C10 alkanediyl, linear or branched C2 to C10 alkenediyl, linear or branched C2 to C10 alkynediyl, and (C2H3R6—O)n—H; Y is selected from OR3, NR3R4, N+R3R4R5 and NH—(C═O)—R3; R3, R4, R5 are the same or different and are selected from (i) H, (ii) C5 to C20 aryl, (iii) C1 to C10 alkyl (iv) C6 to C20 arylalkyl, (v) C6 to C20 alkylaryl, which may be substituted by OH, SO3H, COOH or a combination thereof, and (vi) (C2H3R6—O)n—H, and wherein R3 and R4 may together form a ring system, which may be interrupted by O or NR7; m, n are integers independently selected from 1 to 30; R6 is selected from II and C1 to C5 alkyl; R7 is selected from R6 and formula (II).

公开(公告)号：US20210040635A1

公开(公告)日：2021-02-11

申请号：US17082765

申请日：2020-10-28

Applicant: BASF SE

Inventor： Marcel Patrik KIENLE ,  Dieter MAYER ,  Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET

IPC: C25D3/16 ,  C25D7/12 ,  C25D3/18 ,  H01L21/288 ,  H01L23/532 ,  H01L21/768 ,  H01L23/522

Abstract: A composition comprising (a) cobalt ions, and (b) an additive of formula I wherein R1 is selected from X-Y; R2 is selected from R1 and R3; X is selected from linear or branched C1 to C10 alkanediyl, linear or branched C2 to C10 alkenediyl, linear or branched C2 to C10 alkynediyl, and (C2H3R6—O)m—H; Y is selected from OR3, NR3R4, N+R3R4R5 and NH—(C═O)—R3; R3, R4, R5 are the same or different and are selected from (i) H, (ii) C5 to C20 aryl, (iii) C1 to C10 alkyl (iv) C6 to C20 arylalkyl, (v) C6 to C20 alkylaryl, which may be substituted by OH, SO3H, COOH or a combination thereof, and (vi) (C2H3R6—O)n—H, and wherein R3 and R4 may together form a ring system, which may be interrupted by O or NR7; m, n are integers independently selected from 1 to 30; R6 is selected from H and C1 to C5 alkyl; R7 is selected from R6 and

公开(公告)号：US20220298664A1

公开(公告)日：2022-09-22

申请号：US17805144

申请日：2022-06-02

Applicant: BASF SE

Inventor： Nadine ENGELHARDT ,  Dieter MAYER ,  Marco ARNOLD ,  Alexander FLUEGEL ,  Charlotte EMNET ,  Lucas Benjamin HENDERSON

IPC: C25D3/18 ,  C25D7/12 ,  C25D5/02

Abstract: Described herein is a cobalt electrodeposition composition including cobalt ions, and particular leveling agents including X1—CO—O—R11, X1—SO2—O—R11, X1—PO(OR11)2, X1—SO—O—R11 functional groups, where X1 is a divalent group selected from (i) a chemical bond (ii) aryl, (iii) C1 to C12 alkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group —X11—X12—, (v) an alkylaryl group —X12—X11— and (vi) —(O—C2H3R12)mO—, R11 is selected from H and C1 to C4 alkyl. R12 is selected from H and C1 to C4 alkyl, X12 is a divalent aryl group, and X11 is a divalent C1 to C15 alkandiyl group.

公开(公告)号：US20200173029A1

公开(公告)日：2020-06-04

申请号：US16742085

申请日：2020-01-14

Applicant: BASF SE

Inventor： Cornelia ROEGER-GOEPFERT ,  Roman Benedikt RAETHER ,  Charlotte EMNET ,  Alexandra HAAG ,  Dieter MAYER

IPC: C23C18/31 ,  C25D3/38 ,  H01L21/288 ,  C23C18/32 ,  C25D3/58 ,  H01L21/768

Abstract: Composition comprising a source of metal ions and at least one suppressing agent obtainable by reacting a) an amine compound comprising at least three active amino functional groups with b) a mixture of ethylene oxide and at least one compound selected from C3 and C4 alkylene oxides.

公开(公告)号：US20190309429A1

公开(公告)日：2019-10-10

申请号：US16468467

申请日：2017-12-19

Applicant: BASF SE

Inventor： Marcel Patrik KIENLE ,  Dieter MAYER ,  Marco ARNOLD ,  Alexandra HAAG ,  Charlotte EMNET ,  Alexander FLUEGEL

IPC: C25D3/32 ,  C25D3/38 ,  C25D7/12 ,  H01L21/288

Abstract: The invention relates to a polyamine-based or polyhydric alcohol-based suppressing agent. The suppressing agent is modified by reaction with a compound that introduces a branching group into the suppressing agent before they are reacted with an alkylene oxide. The suppressing agent shows extraordinary superfilling properties, particularly when used to fill in features having extremely small aperture sizes and/or high aspect ratios.