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1.发明申请公开(公告)号：US20220018035A1
公开(公告)日：2022-01-20
申请号：US17312737
申请日：2019-12-10
Applicant: BASF SE
Inventor： Sathana Katayaporn , Charlotte Emnet , Dieter Mayer , Nadine Engelhardt , Marco Arnold , Lucas Benjamin Henderson , Alexander Fluegel
Abstract: Described herein is a composition including metal ions consisting essentially of cobalt ions, and a specific monomeric and polymeric suppressing agent including a carboxylic, sulfonic, sulfinic, phosphonic, or phosphinic acid functional groups which show a suppressing effect that is required for void-free bottom-up filling of nanometer-sized recessed features.
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公开(公告)号：US11926918B2
公开(公告)日：2024-03-12
申请号：US16468467
申请日：2017-12-19
Applicant: BASF SE
Inventor： Marcel Patrik Kienle , Dieter Mayer , Marco Arnold , Alexandra Haag , Charlotte Emnet , Alexander Fluegel
IPC: C25D3/32 , C25D3/02 , C25D3/38 , C25D7/12 , H01L21/288
CPC classification number: C25D3/32 , C25D3/02 , C25D3/38 , C25D7/123 , H01L21/2885
Abstract: The invention relates to a polyamine-based or polyhydric alcohol-based suppressing agent. The suppressing agent is modified by reaction with a compound that introduces a branching group into the suppressing agent before they are reacted with an alkylene oxide. The suppressing agent shows extraordinary superfilling properties, particularly when used to fill in features having extremely small aperture sizes and/or high aspect ratios.
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公开(公告)号：US11486049B2
公开(公告)日：2022-11-01
申请号：US16689710
申请日：2019-11-20
Applicant: BASF SE
Inventor： Cornelia Roeger-Goepfert , Roman Benedikt Raether , Harald Hoerhammer , Marco Arnold , Charlotte Emnet , Dieter Mayer
Abstract: A method of detecting space debris includes: generating a virtual space debris in accordance with the law of conservation of mass by applying a debris breakup model to an object of breakup origin; calculating an orbit of each virtual space debris based on a debris orbit propagation model; and generating appearance frequency distribution of a motion vector of each virtual space debris on the celestial sphere based on the orbit calculation. The above operations are executed multiple times. The method further includes setting a search range vector based on a motion vector having a high level of the appearance frequency distribution of the motion vector, and applying a stacking method to regions in images captured at time intervals during the fixed point observation, the regions being shifted along the search range vector sequentially in the order of capture, thereby detecting space debris appearing on the images.
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4.发明授权公开(公告)号：US12098473B2
公开(公告)日：2024-09-24
申请号：US17312737
申请日：2019-12-10
Applicant: BASF SE
Inventor： Sathana Kitayaporn , Charlotte Emnet , Dieter Mayer , Nadine Engelhardt , Marco Arnold , Lucas Benjamin Henderson , Alexander Fluegel
Abstract: Described herein is a composition including metal ions consisting essentially of cobalt ions, and a specific monomeric and polymeric suppressing agent including a carboxylic, sulfonic, sulfinic, phosphonic, or phosphinic acid functional groups which show a suppressing effect that is required for void-free bottom-up filling of nanometer-sized recessed features.
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Patent Agency Ranking
5.发明申请公开(公告)号：US20210317582A1
公开(公告)日：2021-10-14
申请号：US17329459
申请日：2021-05-25
Applicant: BASF SE
Inventor： Cornelia Röger-Göpfert , Roman Benedikt Raether , Charlotte Emnet , Alexandra Haag , Dieter Mayer
IPC: C23C18/31 , C23C18/32 , C25D3/38 , C25D3/58 , H01L21/768 , H01L21/288 , C25D7/12
Abstract: Described herein is a composition for filling submicrometer sized features having an aperture size of 30 nanometers or less including a source of copper ions, and at least one suppressing agent selected from compounds of formula I where the R1 radicals are each independently selected from a copolymer of ethylene oxide and at least one further C3 to C4 alkylene oxide, said copolymer being a random copolymer, the R2 radicals are each independently selected from R1 or alkyl, X and Y are spacer groups independently, and X for each repeating unit independently, selected from C1 to C6 alkylene and Z—(O—Z)m where the Z radicals are each independently selected from C2 to C6 alkylene, n is an integer equal to or greater than 0, and m is an integer equal to or greater than 1.
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公开(公告)号：US09758885B2
公开(公告)日：2017-09-12
申请号：US14438688
申请日：2013-10-30
Applicant: BASF SE
Inventor： Marcel Patrik Kienle , Dieter Mayer , Cornelia Roeger-Goepfert , Alexandra Haag , Charlotte Emnet , Alexander Fluegel , Marco Arnold
Abstract: A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide, said polyaminoamide comprising the structural unit represented by formula I or derivatives of the polyaminoamide of formula I obtainable by complete or partial protonation, N-functionalization or N-quaternization with a non-aromatic reactant, wherein D6 is, for each repeating unit 1 to s independently, a divalent group selected from a saturated or unsaturated C1-C20 organic radical, D7 is, for each repeating unit 1 to s independently, a divalent group selected from straight chain or branched C2-C20 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, R1 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R2, may form a divalent group D8, and R2 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R1, may form a divalent group D8, and D8 is selected from straight chain or branched C1-C18 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, s is an integer from 1 to 250, R10 is selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl.
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公开(公告)号：US11387108B2
公开(公告)日：2022-07-12
申请号：US16638318
申请日：2018-08-31
Applicant: BASF SE
Inventor： Marcel Patrik Kienle , Cornelia Roeger-Goepfert , Dieter Mayer , Marco Arnold , Alexander Fluegel , Charlotte Emnet
IPC: H01L21/288 , C25D3/38 , C25D5/02 , C25D7/12
Abstract: A composition for metal plating comprising a source of metal ions and at least one leveling agent comprising at least one polyaminoamide comprising a polymer fragment of formula (I) or derivatives thereof obtainable by complete or partial protonation or N-quarternisation.
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公开(公告)号：US11377748B2
公开(公告)日：2022-07-05
申请号：US16762717
申请日：2018-11-19
Applicant: BASF SE
Inventor： Nadine Engelhardt , Dieter Mayer , Marco Arnold , Alexander Fluegel , Charlotte Emnet , Lucas Benjamin Henderson
Abstract: A cobalt electrodeposition composition comprising cobalt ions, and particular leveling agents comprising X1—CO—O—R11, X1—SO2—O—R11, X1—PO(OR11)2, X1—SO—O—R11 functional groups, wherein X1 is a divalent group selected from (i) a chemical bond (ii) aryl, (iii) C1 to C12 alkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group —X11—X12—, (v) an alkylaryl group —X12—X11—, and (vi) —(O—C2H3R12)mO—, R11 is selected from H and C1 to C4 alkyl. R12 is selected from H and C1 to C4 alkyl, X12 is a divalent aryl group, X11 is a divalent C1 to C15 alkandiyl group.
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公开(公告)号：US20150284865A1
公开(公告)日：2015-10-08
申请号：US14438688
申请日：2013-10-30
Applicant: BASF SE
Inventor： Marcel Patrik Kienle , Dieter Mayer , Cornelia Roeger-Goepfert , Alexandra Haag , Charlotte Emnet , Alexander Fluegel , Marco Arnold
Abstract: A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide, said polyaminoamide comprising the structural unit represented by formula I or derivatives of the polyaminoamide of formula I obtainable by complete or partial protonation, N-functionalization or N-quaternization with a non-aromatic reactant,whereinD6 is, for each repeating unit 1 to s independently, a divalent group selected from a saturated or unsaturated C1-C20 organic radical,D7 is, for each repeating unit 1 to s independently, a divalent group selected from straight chain or branched C2-C20 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10,R1 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R2, may form a divalent group D8, andR2 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R1, may form a divalent group D8, andD8 is selected from straight chain or branched C1-C18 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10,s is an integer from 1 to 250,R10 is selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl.
Abstract translation: 包含金属离子源和至少一种包含至少一种聚氨基酰胺的添加剂的组合物，所述聚氨基酰胺包括由式I表示的结构单元或通过完全或部分质子化获得的式I的聚氨基酰胺的衍生物，N-官能化或N- 用非芳香族反应物进行季铵化反应，其中D6为每个重复单元1独立地选自饱和或不饱和的C 1 -C 20有机基团的二价基团，D 7为每个重复单元1独立地为二价 选自直链或支链C 2 -C 20烷二基的基团，其可任选被杂原子或选自O，S和NR 10的二价基团中断，R 1为每个重复单元1至s独立地选自H，C 1 -C 20烷基 和可以任选被羟基，烷氧基或烷氧基羰基取代的C1-C20烯基，或者与R2一起可以形成二价基团D8，并且R2对于每个重复单元1至 独立地选自H，C 1 -C 20烷基和C 1 -C 20链烯基，其可以任选地被羟基，烷氧基或烷氧基羰基取代，或者与R 1一起可以形成二价基团D8，并且D8选自直链 或支链C 1 -C 18烷二基，其可任选被杂原子或选自O，S和NR 10的二价基团中断，s为1至250的整数，R 10选自H，C 1 -C 20烷基和C 1 -C 20链烯基 ，其可以任选地被羟基，烷氧基或烷氧基羰基取代。
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