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公开(公告)号:US11731196B2
公开(公告)日:2023-08-22
申请号:US17394881
申请日:2021-08-05
Applicant: California Institute of Technology
Inventor: Samad A. Firdosy , Robert P. Dillon , Nicholas E. Ury , Katherine Dang , Joshua Berman , Pablo Narvaez , Vilupanur A. Ravi , John Paul Castelo Borgonia , Joelle T. Cooperrider , Bryan W. McEnerney , Andrew A. Shapiro-Scharlotta
CPC classification number: B22F7/02 , B22F3/15 , B22F10/28 , B22F10/64 , B33Y10/00 , B33Y40/20 , B33Y80/00 , H05K9/0081 , B22F2301/35 , B22F2304/10 , Y10T29/49002
Abstract: Systems and methods of additively manufacturing multi-material electromagnetic shields are described. Additive manufacturing processes use co-deposition to incorporate multiple materials and/or microstructures selected to achieve specified shield magnetic properties. Geometrically complex shields can be manufactured with alternating shielding materials optimized for the end use application. The microstructures of the printed shields can be tuned by optimizing the print parameters.
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2.
公开(公告)号:US20220203442A1
公开(公告)日:2022-06-30
申请号:US17394881
申请日:2021-08-05
Applicant: California Institute of Technology
Inventor: Samad A. Firdosy , Robert P. Dillon , Nicholas E. Ury , Katherine Dang , Joshua Berman , Pablo Narvaez , Vilupanur A. Ravi , John Paul Castelo Borgonia , Joelle T. Cooperrider , Bryan W. McEnerney , Andrew A. Shapiro-Scharlotta
Abstract: Systems and methods of additively manufacturing multi-material electromagnetic shields are described. Additive manufacturing processes use co-deposition to incorporate multiple materials and/or microstructures selected to achieve specified shield magnetic properties. Geometrically complex shields can be manufactured with alternating shielding materials optimized for the end use application. The microstructures of the printed shields can be tuned by optimizing the print parameters.
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