公开(公告)号：US20210403690A1

公开(公告)日：2021-12-30

申请号：US17403820

申请日：2021-08-16

Applicant: Cytec Industries Inc.

Inventor： J. Mon Hei ENG ,  Joseph Kozakiewicz ,  Ram B. Gupta ,  Jian-Yang Cho ,  Roderick G. Ryles ,  Fadi Khawam

IPC: C08L23/12 ,  C08K5/3492 ,  C08K5/00 ,  C08K5/3475 ,  C08K5/357 ,  C08K5/06 ,  C08K5/132 ,  C08K5/134 ,  C08K5/1535 ,  C08L23/06 ,  C08L77/06

Abstract: Stabilizer compositions having a stabilizing amount of at least one co-active agent; an ultraviolet light absorber chosen from orthohydroxyphenyl triazine compounds and/or benzoxazinone compounds; and a hindered amine light stabilizer, are provided herein, along with masterbatch concentrates containing same, and processes for using same for stabilizing polymeric organic materials to protect against light and thermal degradation due to exposure to UV irradiation.

公开(公告)号：US20150315465A1

公开(公告)日：2015-11-05

申请号：US14700560

申请日：2015-04-30

Applicant: CYTEC INDUSTRIES INC.

Inventor： Ram B. Gupta ,  Jerry Mon Hei Eng ,  Fadi Khawam ,  Ranjan Kumar Kamat

IPC: C09K15/32 ,  C08K3/22 ,  C08K5/3435 ,  C08K5/527 ,  C08K5/3492 ,  C08K5/105

CPC classification number: C08K5/527 ,  C08K3/01 ,  C08K3/22 ,  C08K3/26 ,  C08K5/105 ,  C08K5/13 ,  C08K5/132 ,  C08K5/1345 ,  C08K5/20 ,  C08K5/3435 ,  C08K5/3462 ,  C08K5/3492 ,  C08K5/375 ,  C08K5/524 ,  C08K13/02 ,  C08K2003/222 ,  C08K2003/2227 ,  C09K15/30

Abstract: Stabilizer compositions for stabilizing materials against degradation due to thermal and ultraviolet light exposure are disclosed herein. In some instances, the stabilizer compositions include an ortho-hydroxyl tris-aryl-s-triazine compound; a hindered amine light stabilizer compound; a hindered hydroxybenzoate compound; a phosphite compound, an acid scavenger and/or thioester; and a hindered phenol antioxidant compound

Abstract translation: 本文公开了用于稳定材料以防止由于热和紫外线暴露引起的劣化的稳定剂组合物。 在一些情况下，稳定剂组合物包括邻羟基三 - 芳基-s-三嗪化合物; 受阻胺光稳定剂化合物; 受阻羟基苯甲酸酯化合物; 亚磷酸酯化合物，酸清除剂和/或硫酯; 和受阻酚抗氧化剂

公开(公告)号：US12215215B2

公开(公告)日：2025-02-04

申请号：US17365172

申请日：2021-07-01

Applicant: Cytec Industries Inc.

Inventor： Jerry Mon Hei Eng ,  Joseph Kozakiewicz ,  Ram B. Gupta ,  Jian-Yang Cho ,  Roderick G. Ryles ,  Fadi Khawam

IPC: C08L23/12 ,  C08K5/00 ,  C08K5/06 ,  C08K5/132 ,  C08K5/134 ,  C08K5/1535 ,  C08K5/3475 ,  C08K5/3492 ,  C08K5/357 ,  C08L23/06 ,  C08L77/06

Abstract: Stabilizer compositions having a stabilizing amount of at least one co-active agent; an ultraviolet light absorber chosen from an ortho-hydroxy benzophenone, and/or an ortho-hydroxyphenyl benzotriazole; and a hindered amine light stabilizer, are provided herein, along with masterbatch concentrates containing same, and processes for using same for stabilizing polymeric organic materials to protect against light and thermal degradation due to exposure to UV irradiation.

公开(公告)号：US20170349730A1

公开(公告)日：2017-12-07

申请号：US15624229

申请日：2017-06-15

Applicant: Cytec Industries Inc.

Inventor： Ram B. Gupta ,  Jerry Mon Hei Eng ,  Fadi Khawam ,  Ranjan Kumar Kamat

IPC: C08K5/527 ,  C08K5/3435 ,  C08K3/22 ,  C08K13/02 ,  C08K5/524 ,  C08K5/375 ,  C08K5/3492 ,  C08K5/3462 ,  C08K3/00 ,  C08K5/20 ,  C08K5/134 ,  C08K5/132 ,  C08K5/13 ,  C08K5/105 ,  C08K3/26 ,  C09K15/30

CPC classification number: C08K5/527 ,  C08K3/01 ,  C08K3/22 ,  C08K3/26 ,  C08K5/105 ,  C08K5/13 ,  C08K5/132 ,  C08K5/1345 ,  C08K5/20 ,  C08K5/3435 ,  C08K5/3462 ,  C08K5/3492 ,  C08K5/375 ,  C08K5/524 ,  C08K13/02 ,  C08K2003/222 ,  C08K2003/2227 ,  C09K15/30

Abstract: A process for producing a stabilized molded article including: combining a stabilizing amount of a thermal and ultraviolet (UV) light stabilizer composition with an organic material subject to degradation induced by light, heat or oxidation to form a stabilized organic material; and forming the stabilized organic material into a molded article, wherein the stabilizer composition comprises an ortho-hydroxyl tris-aryl-s-triazine compound; a hindered amine light stabilizer compound; a hindered hydroxybenzoate compound; an acid scavenger; a phosphite compound; a hindered phenol antioxidant compound; and a thioester compound

公开(公告)号：US11091615B2

公开(公告)日：2021-08-17

申请号：US14947163

申请日：2015-11-20

Applicant: Cytec Industries Inc.

Inventor： J. Mon Hei Eng ,  Joseph Kozakiewicz ,  Ram B. Gupta ,  Jian-Yang Cho ,  Roderick G. Ryles ,  Fadi Khawam

IPC: C08L23/12 ,  C08K5/3492 ,  C08K5/00 ,  C08K5/3475 ,  C08K5/357 ,  C08K5/06 ,  C08K5/132 ,  C08K5/134 ,  C08K5/1535 ,  C08L23/06 ,  C08L77/06

Abstract: Stabilizer compositions having a stabilizing amount of at least one co-active agent; and a stabilizing amount of any one or more ultraviolet light absorber chosen from an ortho-hydroxyphenyl triazine, an ortho-hydroxy benzophenone, or an ortho-hydroxyphenyl benzotriazole, optionally in combination with a stabilizing amount of a hindered amine light stabilizer, are provided herein, along with masterbatch concentrates containing same, and processes for using same for stabilizing organic materials to protect against light and thermal degradation due to exposure to UV irradiation.

公开(公告)号：US09725579B2

公开(公告)日：2017-08-08

申请号：US14700560

申请日：2015-04-30

Applicant: CYTEC INDUSTRIES INC.

Inventor： Ram B. Gupta ,  Jerry Mon Hei Eng ,  Fadi Khawam ,  Ranjan Kumar Kamat

IPC: C08K3/22 ,  C08K5/3435 ,  C08K5/527 ,  C08K5/3492 ,  C08K5/105 ,  C09K15/32 ,  C08K3/00 ,  C08K3/26 ,  C09K15/30 ,  C08K5/13 ,  C08K5/132 ,  C08K5/134 ,  C08K5/20 ,  C08K5/3462 ,  C08K5/375 ,  C08K5/524 ,  C08K13/02

CPC classification number: C08K5/527 ,  C08K3/01 ,  C08K3/22 ,  C08K3/26 ,  C08K5/105 ,  C08K5/13 ,  C08K5/132 ,  C08K5/1345 ,  C08K5/20 ,  C08K5/3435 ,  C08K5/3462 ,  C08K5/3492 ,  C08K5/375 ,  C08K5/524 ,  C08K13/02 ,  C08K2003/222 ,  C08K2003/2227 ,  C09K15/30

Abstract: Stabilizer compositions for stabilizing materials against degradation due to thermal and ultraviolet light exposure are disclosed herein. In some instances, the stabilizer compositions include an ortho-hydroxyl tris-aryl-s-triazine compound; a hindered amine light stabilizer compound; a hindered hydroxybenzoate compound; a phosphite compound, an acid scavenger and/or thioester; and a hindered phenol antioxidant compound.

公开(公告)号：US12227635B2

公开(公告)日：2025-02-18

申请号：US17403820

申请日：2021-08-16

Applicant: Cytec Industries Inc.

Inventor： J. Mon Hei Eng ,  Joseph Kozakiewicz ,  Ram B. Gupta ,  Jian-Yang Cho ,  Roderick G. Ryles ,  Fadi Khawam

IPC: C08L23/12 ,  C08K5/00 ,  C08K5/06 ,  C08K5/132 ,  C08K5/134 ,  C08K5/1535 ,  C08K5/3475 ,  C08K5/3492 ,  C08K5/357 ,  C08L23/06 ,  C08L77/06

Abstract: Stabilizer compositions having a stabilizing amount of at least one co-active agent; an ultraviolet light absorber chosen from orthohydroxyphenyl triazine compounds and/or benzoxazinone compounds; and a hindered amine light stabilizer, are provided herein, along with masterbatch concentrates containing same, and processes for using same for stabilizing polymeric organic materials to protect against light and thermal degradation due to exposure to UV irradiation.

公开(公告)号：US10407563B2

公开(公告)日：2019-09-10

申请号：US15624229

申请日：2017-06-15

Applicant: Cytec Industries Inc.

Inventor： Ram B. Gupta ,  Jerry Mon Hei Eng ,  Fadi Khawam ,  Ranjan Kumar Kamat

IPC: C08K5/527 ,  C08K5/3435 ,  C08K3/22 ,  C08K13/02 ,  C08K5/20 ,  C08K5/105 ,  C08K3/26 ,  C09K15/30 ,  C08K5/13 ,  C08K5/132 ,  C08K5/134 ,  C08K5/3462 ,  C08K5/3492 ,  C08K5/375 ,  C08K5/524 ,  C08K3/01

Abstract: A process for producing a stabilized molded article including: combining a stabilizing amount of a thermal and ultraviolet (UV) light stabilizer composition with an organic material subject to degradation induced by light, heat or oxidation to form a stabilized organic material; and forming the stabilized organic material into a molded article, wherein the stabilizer composition comprises an ortho-hydroxyl tris-aryl-s-triazine compound; a hindered amine light stabilizer compound; a hindered hydroxybenzoate compound; an acid scavenger; a phosphite compound; a hindered phenol antioxidant compound; and a thioester compound.