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1.发明申请PHENOXYPYRAZOLE COMPOSITION AND PROCESS FOR THE SOLVENT EXTRACTION OF METALS 审中-公开苯并噻唑组合物和溶剂萃取金属的方法公开(公告)号：US20140264166A1
公开(公告)日：2014-09-18
申请号：US14287645
申请日：2014-05-27
Applicant: Cytec Technology Corp.
Inventor： John Campbell , Ronald Matthys Swart , Lucy Emeleus , Susan Owens
IPC: C22B3/16
CPC classification number: C22B3/1666 , C07D231/12 , C07D231/14 , C22B3/0035 , C22B3/0036 , C22B15/0063 , C22B15/0089 , Y02P10/234 , Y02P10/236
Abstract: Metal extractants of 2-hydroxyphenyldiazole compounds according to Formula (2): and tautomers and salts thereof, are disclosed, wherein substituents R5, R7, R9, and R10 are as defined herein.
Abstract translation: 公开了根据式（2）的2-羟基苯基二唑化合物的金属萃取剂及其互变异构体和盐，其中取代基R5，R7，R9和R10如本文所定义。
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2.发明申请Phenoxypyrazole Composition and Process for the Solvent Extraction of Metals 审中-公开苯氧吡唑组合物和溶剂萃取金属的方法公开(公告)号：US20130264519A1
公开(公告)日：2013-10-10
申请号：US13904089
申请日：2013-05-29
Applicant: Cytec Technology Corp.
Inventor： John Campbell , Ronald Matthys Swart , Lucy Emeleus , Susan Owens
IPC: C22B3/16
CPC classification number: C22B3/1666 , C07D231/12 , C07D231/14 , C22B3/0035 , C22B3/0036 , C22B15/0063 , C22B15/0089 , Y02P10/234 , Y02P10/236
Abstract: Metal extractants of 2-hydroxyphenyldiazole compounds according to Formula (2): and tautomers and salts thereof, are disclosed, wherein substituents R5, R7, R9, and R10 are as defined herein.
Abstract translation: 公开了根据式（2）的2-羟基苯基二唑化合物的金属萃取剂及其互变异构体和盐，其中取代基R5，R7，R9和R10如本文所定义。
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