BLOCK COPOLYMER AND PRODUCTION METHOD FOR BLOCK COPOLYMER

    公开(公告)号:US20200207900A1

    公开(公告)日:2020-07-02

    申请号:US16634685

    申请日:2018-07-31

    Abstract: Disclosed is a block copolymer including one or more blocks of an acrylate polymer and one or more blocks of a chloroprene polymer, wherein the number average molecular weight of the block copolymer is 110,000 or more, the number average molecular weight of the block of a chloroprene polymer is 80,000 or more in total, and the block copolymer has a functional group with a structure represented by the following chemical formula (1) or (2): wherein in the chemical formula (1), R1 represents hydrogen, chlorine, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group or a substituted, or unsubstituted heterocyclyl group.

    CHLOROPRENE POLYMER, CHLOROPRENE POLYMER COMPOSITION, VULCANIZATION MOLDED BODY AND ROLL

    公开(公告)号:US20240158555A1

    公开(公告)日:2024-05-16

    申请号:US18552801

    申请日:2022-03-07

    CPC classification number: C08F236/18

    Abstract: A chloroprene polymer having a structural unit derived from chloroprene and a structural unit derived from an unsaturated nitrile, in which the chloroprene polymer has peak tops at 5.80 to 6.00 ppm and 5.10 to 5.30 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, in the 1H-NMR spectrum, a peak area ratio A/B of a peak area A at 5.80 to 6.00 ppm and a peak area B at 4.05 to 6.20 ppm is 0.9/100 to 1.1/100, and the peak area A, the peak area B, and a peak area C at 5.10 to 5.30 ppm satisfy formula “(C−2A)/B≤2.0/100”, and a content of the structural unit derived from an unsaturated nitrile is more than 0% by mass and 23% by mass or less.

    CHLOROPRENE POLYMER AND PRODUCTION METHOD THEREFOR

    公开(公告)号:US20200165421A1

    公开(公告)日:2020-05-28

    申请号:US16631594

    申请日:2018-07-20

    Abstract: Provided is a chloroprene-based polymer having an industrially applicable sufficient molecular weight and capable of obtaining a vulcanized rubber excellent in durability and fatigue endurance and an adhesive excellent in layer separation resistance. A chloroprene-based polymer having a number average molecular weight Mn of 150000 to 300000 and comprising a functional group of a structure represented by the general formula (1) or (2) below: (wherein in the general formula (1), R1 shows hydrogen, chlorine, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclyl group.)

    COMPOSITION AND CURED PRODUCT THEREOF
    8.
    发明公开

    公开(公告)号:US20230365797A1

    公开(公告)日:2023-11-16

    申请号:US18026028

    申请日:2021-09-09

    Abstract: A composition comprises: a resin component including an olefin-aromatic vinyl compound-aromatic polyene copolymer satisfying all the following conditions (1) to (4): (1) a number average molecular weight of the copolymer is 500 or more and 100000 or less; (2) the aromatic vinyl compound monomer is an aromatic vinyl compound having 8 or more and 20 or less carbon atoms, and a content of a unit of the aromatic vinyl compound monomer is 0 mass % or more and 70 mass % or less; (3) the aromatic polyene is one or more selected from polyenes having 5 or more and 20 or less carbon atoms and having a plurality of vinyl groups and/or vinylene groups in the molecule, and a content of the vinyl groups and/or the vinylene groups derived from the unit of the aromatic polyene is 1.5 pieces or more and less than 20 pieces per number average molecular weight; and (4) the olefin is one or more selected from olefins having 2 or more and 20 or less carbon atoms, and a total of units of the olefin monomer, the aromatic vinyl compound monomer, and the aromatic polyene monomer is 100 mass %; and a surface-treated silica. The volume ratio between the resin component and the silica is in the range of 98 to 15:2 to 85. A cured product of the composition has a value of the dielectric tangent obtained by resonator method at a measurement frequency of 10 GHz and/or a measurement frequency range of 25 GHz to 40 GHz of 1.2×10−3 or less and a storage elastic modulus at 250° C. in the range of 10 MPa or more and 10 GPa or less.

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