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    Process for improving the emissions of electron field emitters
    2.
    发明授权
    Process for improving the emissions of electron field emitters 失效
    改善电子场发射体排放的方法

    公开(公告)号：US07449082B2

    公开(公告)日：2008-11-11

    申请号：US11715518

    申请日：2007-03-08

    Applicant: David Herbert Roach

    Inventor： David Herbert Roach

    IPC: B32B38/10 ,  H01J1/62

    CPC classification number: B82Y10/00 ,  H01J1/3048 ,  H01J9/025 ,  H01J2201/30469 ,  H01J2329/00

    Abstract: This invention provides a process for improving the field emission of an electron field emitter comprised of an acicular emitting substance such as acicular carbon, an acicular semiconductor, an acicular metal or a mixture thereof, comprising applying a force to the surface of the electron field emitter wherein the force results in the removal of a portion of the electron field emitter thereby forming a new surface of the electron field emitter.

    Abstract translation: 本发明提供了一种改进由诸如针状碳，针状半导体，针状金属或其混合物的针状发射物质组成的电子场发射体的场发射的方法，包括向电子场发射体的表面施加力 其中所述力导致去除所述电子场发射体的一部分，从而形成所述电子场发射体的新表面。

    FIELD EMISSION DEVICE WITH PROTECTING VAPOR
    4.
    发明申请
    FIELD EMISSION DEVICE WITH PROTECTING VAPOR 失效
    具有保护蒸气的场发射装置

    公开(公告)号：US20110101859A1

    公开(公告)日：2011-05-05

    申请号：US12673586

    申请日：2008-08-20

    Applicant: Adam Fennimore ,  David Herbert Roach

    Inventor： Adam Fennimore ,  David Herbert Roach

    IPC: H01J17/22

    CPC classification number: H01J29/94 ,  H01J9/395 ,  H01J31/123

    Abstract: A field emission device in which a protectin vapor is present in an evacuated space between a field emission cathode assembly and an anode. The protectin vapor may be one or more hydrogen-containing gases suc as a gas containing M—H bonds where M may be C, Si, B, Al or P. The protecting vapor has within the evacuated space a partial pressure greater than about 10−8 Torr (1.33×10−6Pe) et 20° C.

    Abstract translation: 场致发射器件，其中保护素蒸气存在于场致发射阴极组件和阳极之间的抽空空间中。 保护蒸气可以是一种或多种含氢气体，作为含有M-H键的气体，其中M可以是C，Si，B，Al或P.保护蒸汽在抽空空间内具有大于约10分压 -8托（1.33×10-6Pe）等20℃

    Processes for growing carbon nanotubes in the absence of catalysts
    5.
    发明申请
    Processes for growing carbon nanotubes in the absence of catalysts 审中-公开
    在不存在催化剂的情况下生长碳纳米管的方法

    公开(公告)号：US20100119435A1

    公开(公告)日：2010-05-13

    申请号：US11375743

    申请日：2006-03-15

    Applicant: David Herbert Roach ,  Gillian Althea Maria Reynolds

    Inventor： David Herbert Roach ,  Gillian Althea Maria Reynolds

    IPC: D01F9/12

    CPC classification number: D01F9/12

    Abstract: Processes for increasing the production rate of single-wall carbon nanotubes using a disordered carbon target are disclosed. The processes use a disordered carbon target and include vaporization of the target in the presence of a non-oxidizing gas. The single-wall nanotubes produced can be incorporated into electronic devices such as diodes and transistors.

    Abstract translation: 公开了使用无序碳目标提高单壁碳纳米管的生产速率的方法。 该方法使用无序碳目标，并且包括在非氧化气体存在下目标物的蒸发。 所生产的单壁纳米管可以并入电子器件如二极管和晶体管。

    Field emission device with protecting vapor
    7.
    发明授权
    Field emission device with protecting vapor 失效
    具有保护蒸汽的场致发射装置

    公开(公告)号：US08076834B2

    公开(公告)日：2011-12-13

    申请号：US12673586

    申请日：2008-08-20

    Applicant: Adam Fennimore ,  David Herbert Roach

    Inventor： Adam Fennimore ,  David Herbert Roach

    IPC: H01J29/94 ,  H01J9/395

    CPC classification number: H01J29/94 ,  H01J9/395 ,  H01J31/123

    Abstract: A field emission device in which a protecting vapor is present in an evacuated space between a field emission cathode assembly and an anode. The protecting vapor may be one or more hydrogen-containing gases such as a gas containing M—H bonds where M may be C, Si, B, Al or P.

    Abstract translation: 场致发射装置，其中保护蒸气存在于场致发射阴极组件和阳极之间的抽空空间中。 保护蒸汽可以是一种或多种含氢气体，例如含有M-H键的气体，其中M可以是C，Si，B，Al或P.

    POSITIVE IMAGEABLE THICK FILM COMPOSITION
    10.
    发明申请
    POSITIVE IMAGEABLE THICK FILM COMPOSITION 审中-公开
    积极成像厚膜组成

    公开(公告)号：US20080166666A1

    公开(公告)日：2008-07-10

    申请号：US12042772

    申请日：2008-03-05

    Applicant: David Herbert Roach ,  Young H. Kim ,  Lap-Tak Andrew Cheng

    Inventor： David Herbert Roach ,  Young H. Kim ,  Lap-Tak Andrew Cheng

    IPC: G03F7/40

    CPC classification number: G03F7/0392 ,  G03F7/0047 ,  G03F7/023

    Abstract: This invention provides compositions that can be used as positive imageable photoresists. These compositions include positive imageable photopolymer systems and particulate materials. These compositions can be used in thick film and other processes to make films and patterned structures that are useful in producing electronic devices.

    Abstract translation: 本发明提供可用作可成像光刻胶的组合物。 这些组合物包括可成像的光聚合物体系和颗粒材料。 这些组合物可用于厚膜和其它方法以制备可用于制造电子器件的膜和图案结构。

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