公开(公告)号：US06934040B1

公开(公告)日：2005-08-23

申请号：US10672558

申请日：2003-09-26

Applicant: Charles W. Schietinger ,  Anh N. Hoang ,  Dmitry V. Bakin

Inventor： Charles W. Schietinger ,  Anh N. Hoang ,  Dmitry V. Bakin

IPC: B24B37/013 ,  B24B49/04 ,  B24B49/12 ,  G01B11/06 ,  G01N21/47 ,  G01B11/28

CPC classification number: B24B37/013 ,  B24B49/04 ,  B24B49/12 ,  G01B11/0625 ,  G01N21/4738

Abstract: A characteristic of a surface is measured by illuminating the surface with optical radiation over a wide angle and receiving radiation reflected from the surface over an angle that depends on the extend of the illumination angle. An emissivity measurement is made for the surface, and, alternatively, if a reflectivity measurement is made, it becomes more accurate. One application is to measure the thickness of a layer or layers, either a layer made of transparent material or a metal layer. A one or multiple wavelength technique allow very precise measurements of layer thickness. Noise from ambient radiation is minimized by modulating the radiation source at a frequency where such noise is a minimum or non-existent. The measurements may be made during processing of the surface in order to allow precise control of processing semiconductor wafers, flat panel displays, or other articles. A principal application is in situ monitoring of film thickness reduction by chemical-mechanical-polishing (CMP).

Abstract translation: 通过用广角的光学辐射照射表面并且接收从取决于照明角度的延伸的角度接收从表面反射的辐射来测量表面的特性。 对于表面进行发射率测量，或者如果进行反射率测量，则其变得更准确。 一种应用是测量一层或多层的厚度，即由透明材料或金属层制成的层。 一种或多种波长技术允许对层厚度进行非常精确的测量。 通过以这样的噪声为最小或不存在的频率调制辐射源来最小化来自环境辐射的噪声。 在处理表面期间可以进行测量，以便能够精确地控制半导体晶片，平板显示器或其他物品的处理。 主要应用是通过化学机械抛光（CMP）原位监测膜厚减少。

公开(公告)号：US06222632B1

公开(公告)日：2001-04-24

申请号：US09287651

申请日：1999-04-07

Applicant: Dmitry V. Bakin

Inventor： Dmitry V. Bakin

IPC: G01J345

CPC classification number: G01J3/453

Abstract: An instrument for determining spectral content of an input light. The instrument has a rotating optical element that separates an input light into two partial beams and thereby introduces a variable OPD between the partial beams. The instrument then records an interferogram as a function of the variable OPD and thereby Fourier or Fast Fourier transforms the interferogram into a spectrogram so that the spectral content of the input light is revealed.

Abstract translation: 用于确定输入光的光谱含量的仪器。 仪器具有旋转的光学元件，其将输入光分离成两个部分光束，从而在部分光束之间引入可变OPD。 然后，仪器记录作为可变OPD的函数的干涉图，由此傅立叶或快速傅里叶变换干涉图到光谱图中，以便显示输入光的光谱含量。

公开(公告)号：US06985299B2

公开(公告)日：2006-01-10

申请号：US10918830

申请日：2004-08-13

Applicant: Dmitry V. Bakin ,  Cheng-Chung Huang

Inventor： Dmitry V. Bakin ,  Cheng-Chung Huang

IPC: G02B13/22 ,  G02B17/00

CPC classification number: G02B6/3582 ,  G02B6/30 ,  G02B6/3512 ,  G02B6/3546 ,  G02B6/356 ,  G02B6/359 ,  G02B13/22

Abstract: In the beam path of an Optical Cross Connect between the front face of a fiber block and a moveable mirror array are placed a telecentric lens and multi-surface optical element. The lens is placed adjacent the front face with a front focal plane coinciding with the front face. The substantially parallel beam path axes between the front face and the telecentric lens are converted by the lens into dispersing directions towards the optical element. Discrete optical surfaces of the optical element redirect the dispersing beam paths in a fashion such that the beam paths coincide in the following with corresponding moveable mirrors of a mirror array. Pitches of arrayed fiber ends and of the optical surfaces as well as the moveable mirrors are independently selectable. The telecentric lens simultaneously focuses the signal beams with improved beam separation and reduced signal loss.

Abstract translation: 在光纤块的前表面和可移动反射镜阵列之间的光学交叉连接的光束路径中放置有远心透镜和多表面光学元件。 透镜被放置在与正面相邻的前焦面上，与前表面重合。 前表面和远心透镜之间的基本上平行的光束路径轴由透镜转换成朝向光学元件的分散方向。 光学元件的离散光学表面以使得光束路径在后面与反射镜阵列的相应可移动反射镜重合的方式重新分配分散光束路径。 阵列纤维端部和光学表面以及可移动反射镜的间距可独立选择。 远心透镜同时聚焦信号光束，改善光束分离和减少信号损失。

公开(公告)号：US06654132B1

公开(公告)日：2003-11-25

申请号：US09577795

申请日：2000-05-24

Applicant: Charles W. Schietinger ,  Anh N. Hoang ,  Dmitry V. Bakin

Inventor： Charles W. Schietinger ,  Anh N. Hoang ,  Dmitry V. Bakin

IPC: G01B1128

CPC classification number: B24B37/013 ,  B24B49/04 ,  B24B49/12 ,  G01B11/0625 ,  G01N21/4738

Abstract: A characteristic of a surface is measured by illuminating the surface with optical radiation over a wide angle and receiving radiation reflected from the surface over an angle that depends on the extend of the illumination angle. An emissivity measurement is made for the surface, and, alternatively, if a reflectivity measurement is made, it becomes more accurate. One application is to measure the thickness of a layer or layers, either a layer made of transparent material or a metal layer. A one or multiple wavelength technique allow very precise measurements of layer thickness. Noise from ambient radiation is minimized by modulating the radiation source at a frequency where such noise is a minimum or non-existent. The measurements may be made during processing of the surface in order to allow precise control of processing semiconductor wafers, flat panel displays, or other articles. A principal application is in situ monitoring of film thickness reduction by chemical-mechanical-polishing (CMP).

Abstract translation: 通过用广角的光学辐射照射表面并且接收从取决于照明角度的延伸的角度接收从表面反射的辐射来测量表面的特性。 对于表面进行发射率测量，或者如果进行反射率测量，则其变得更准确。 一种应用是测量一层或多层的厚度，即由透明材料或金属层制成的层。 一种或多种波长技术允许对层厚度进行非常精确的测量。 通过以这样的噪声为最小或不存在的频率调制辐射源来最小化来自环境辐射的噪声。 在处理表面期间可以进行测量，以便能够精确地控制半导体晶片，平板显示器或其他物品的处理。 主要应用是通过化学机械抛光（CMP）原位监测膜厚减少。

公开(公告)号：US07027232B2

公开(公告)日：2006-04-11

申请号：US10354887

申请日：2003-01-29

Applicant: Dmitry V. Bakin ,  Cheng-Chung Huang

Inventor： Dmitry V. Bakin ,  Cheng-Chung Huang

IPC: G02B13/22 ,  G02B17/08 ,  G02B6/32

CPC classification number: G02B6/3582 ,  G02B6/30 ,  G02B6/3512 ,  G02B6/3546 ,  G02B6/356 ,  G02B6/359 ,  G02B13/22

Abstract: In the beam path of an Optical Cross Connect between the front face of a fiber block and a moveable mirror array are placed a telecentric lens and multi-surface optical element. The lens is placed adjacent the front face with a front focal plane coinciding with the front face. The substantially parallel beam path axes between the front face and the telecentric lens are converted by the lens into dispersing directions towards the optical element. Discrete optical surfaces of the optical element redirect the dispersing beam paths in a fashion such that the beam paths coincide in the following with corresponding moveable mirrors of a mirror array. Pitches of arrayed fiber ends and of the optical surfaces as well as the moveable mirrors are independently selectable. The telecentric lens simultaneously focuses the signal beams with improved beam separation and reduced signal loss.

公开(公告)号：US07042581B2

公开(公告)日：2006-05-09

申请号：US11013070

申请日：2004-12-15

Applicant: Charles W. Schietinger ,  Anh N. Hoang ,  Dmitry V. Bakin

Inventor： Charles W. Schietinger ,  Anh N. Hoang ,  Dmitry V. Bakin

IPC: G01B11/28 ,  G01B11/02

CPC classification number: B24B37/013 ,  B24B49/04 ,  B24B49/12 ,  G01B11/0625 ,  G01N21/4738

Abstract: A characteristic of a surface is measured by illuminating the surface with optical radiation over a wide angle and receiving radiation reflected from the surface over an angle that depends on the extend of the illumination angle. An emissivity measurement is made for the surface, and, alternatively, if a reflectivity measurement is made, it becomes more accurate. One application is to measure the thickness of a layer or layers, either a layer made of transparent material or a metal layer. A one or multiple wavelength technique allow very precise measurements of layer thickness. Noise from ambient radiation is minimized by modulating the radiation source at a frequency where such noise is a minimum or non-existent. The measurements may be made during processing of the surface in order to allow precise control of processing semiconductor wafers, flat panel displays, or other articles. A principal application is in situ monitoring of film thickness reduction by chemical-mechanical-polishing (CMP).