公开(公告)号：US20020170815A1

公开(公告)日：2002-11-21

申请号：US09853762

申请日：2001-05-14

Applicant: EBARA CORPORATION

Inventor： Toshiaki Fujii

IPC: B01J019/08 ,  B01D053/00

CPC classification number: B01D53/66 ,  B01D53/007 ,  B01D53/8668 ,  B01D2255/802 ,  B01D2257/106 ,  B01D2258/0216 ,  B01D2259/804

Abstract: A method and an apparatus for purifying a gas containing contaminants are disclosed. The gas is irradiated with an ultraviolet ray and/or a radiation ray so as to produce microparticles of the contaminants. The resultant microparticles of the contaminants are contacted with a photocatalyst. Then, the photocatalyst is irradiated with light so as to decompose the contaminants held in contact with the photocatalyst. Organic compounds, organosilicon compounds, basic gas and the like can be decomposed by the action of the photocatalyst. Even when these species are present at a low concentration, they can be concentrated locally by transforming into microparticles, and hence can be removed.

Abstract translation: 公开了一种用于净化含有污染物的气体的方法和装置。 用紫外线和/或辐射线照射气体，以产生污染物的微粒。 所得到的污染物微粒与光催化剂接触。 然后，用光照射光催化剂，以分解与光催化剂接触的污染物。 有机化合物，有机硅化合物，碱性气体等可以通过光催化剂的作用而分解。 即使这些物质以低浓度存在，也可以通过转化为微粒而局部浓缩，因此可以除去。

公开(公告)号：US20030183503A1

公开(公告)日：2003-10-02

申请号：US10401631

申请日：2003-03-31

Applicant: EBARA CORPORATION

Inventor： Toshiaki Fujii

IPC: B01J019/08 ,  B01J019/12

CPC classification number: B01D53/66 ,  B01D53/007 ,  B01D53/8668 ,  B01D2255/802 ,  B01D2257/106 ,  B01D2258/0216 ,  B01D2259/804

Abstract: A method and an apparatus for purifying a gas containing contaminants are disclosed. The gas is irradiated with an ultraviolet ray and/or a radiation ray so as to produce microparticles of the contaminants. The resultant microparticles of the contaminants are contacted with a photocatalyst. Then, the photocatalyst is irradiated with light so as to decompose the contaminants held in contact with the photocatalyst. Organic compounds, organosilicon compounds, basic gas and the like can be decomposed by the action of the photocatalyst. Even when these species are present at a low concentration, they can be concentrated locally by transforming into microparticles, and hence can be removed.

公开(公告)号：US20010029964A1

公开(公告)日：2001-10-18

申请号：US09845177

申请日：2001-05-01

Applicant: EBARA CORPORATION

Inventor： Toshiaki Fujii ,  Kikuo Okuyama ,  Manabu Shimada

IPC: B08B006/00

CPC classification number: H01L21/02046 ,  B08B6/00 ,  H01L21/67028 ,  Y10S134/902

Abstract: A method and an apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room, are disclosed. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.

Abstract translation: 公开了一种用于从洁净室中的诸如半导体晶片的物品的表面去除颗粒的方法和装置。 颗粒被带有电荷。 随后，当施加电场以从表面驱走带电粒子时，将超声波或气流施加到制品的表面上，从而从表面除去尺寸小于1微米的颗粒。 收集构件的存在允许去除所得到的浮动颗粒。