公开(公告)号：US20160284548A1

公开(公告)日：2016-09-29

申请号：US15073455

申请日：2016-03-17

Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

Inventor： Moon Youn JUNG ,  Jisu LEE

IPC: H01L21/225 ,  H01L21/268 ,  H01L21/033 ,  H01L21/228

CPC classification number: H01L21/268 ,  H01L21/2225 ,  H01L21/223 ,  H01L21/2254 ,  H01L21/823814 ,  H01L29/66568

Abstract: Provided is a method of doping a substrate. The method includes providing the substrate, providing a target material on the substrate, and implanting a dopant of the target material into the substrate by providing a laser beam to the target material.

Abstract translation: 提供了掺杂衬底的方法。 该方法包括提供衬底，在衬底上提供目标材料，以及通过向目标材料提供激光束将目标材料的掺杂剂注入到衬底中。