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    Pi-cyclopentadienyl cobalt cyclopentadiene compounds
    5.
    发明授权
    Pi-cyclopentadienyl cobalt cyclopentadiene compounds 失效

    公开(公告)号：US3088961A

    公开(公告)日：1963-05-07

    申请号：US3943860

    申请日：1960-06-29

    Applicant: ETHYL CORP

    Inventor： GEOFFREY WILKINSON

    IPC: C07F9/74 ,  C07F15/06 ,  C07F17/00 ,  C10L1/30 ,  C23C16/18 ,  F02B3/06 ,  H01B1/00

    CPC classification number: C10L10/10 ,  C07F9/743 ,  C07F15/06 ,  C07F17/00 ,  C10L1/30 ,  C10L1/305 ,  C23C16/18 ,  F02B3/06 ,  H01B1/00

    Abstract: Compounds of formula (p -Cy)Co(C5H5X) where (p -Cy) is a cyclopentadienyl or indenyl radical and (C5H5X) is a cyclopentadiene molecule in which X is hydrogen, deuterium, a C1-C10 alkyl group, a C6-C10 aryl group or a mono- or di-halosubstituted C1-C10 alkyl or C6-C10 group may be added to gasoline, jet fuels or diesel fuels. The gasoline may also contain tetraethyl lead or other anti-knock agents and scavengers such as ethylenedichloride and ethylenedibromide. A typical compound is cyclopentadienyl cobalt cyclopentadiene.ALSO:The invention comprises cyclopentadienyl cobalt cyclopentadiene compounds of formula (p -Cy)CO(C5H5X) when (p -Cy) is a cyclopentadienyl or indenyl radical, and (C5H5X) is a cyclopentadiene molecule in which X is hydrogen, deuterium, a C1-C10 alkyl group, a C6-C10 aryl group, or a mono- or di-halosubstituted C1-C10 alkyl or C6-C10 aryl group. Specified compounds include cyclopentadienyl cobalt cyclopentadiene, cyclopentadienyl cobalt deuterocyclopentadiene, methylcyclopentadienyl cobalt methylcyclopentadiene, cyclopentadienyl cobalt- 1-endomethylcyclopentadiene, and cyclopentadienyl cobalt 1-endodichloromethylcyclopentadiene. The term 'endo' is used throughout the specification with a particular meaning which is defined therein, and not in the conventional sense of a bridging group. They may be prepared by: (1) reacting a bis(p -Cy) cobalt cation with a reducing agent such as sodium borohydride and lithium aluminium in the presence of a neutral solvent; (2) reacting a bis(p -Cy) cobalt compound with an organic halide such as methyl iodide, ethyl bromide, butyl iodide, phenyl iodide and ethylphenyl bromide; or (3) reacting perhalo alkyl-substituted compounds such as (p -Cy) cobalt 1-endotrihalomethylcyclopentadiene with a reducing agent. Reactions (1) and (2) may be carried out in the presence of a solvent such as hexane, heptane, octane, tetrahydrofuran, dioxane, ethyleneglycol dimethyl and dibutyl ethers and diethylene glycol dimethyl, diethyl and dibutyl ethers. Reactions (1), (2) and (3) may be carried out under an inert blanketing gas such as nitrogen, argon, krypton or neon.ALSO:Cobalt may be deposited on glass, glass cloth, resins and other insulating supports by the thermal decomposition in an inert gas e.g. argon of a compound of formula (p -Cy)CO(C5H5X) where (p -Cy) is a cyclopentadienyl or indenyl radical and (C5H5X) is a cyclopentadiene molecule in which X is hydrogen, deuterium, a C1-C10 alkyl group, a C6-C10 alkyl or C6-C10 aryl group, such as cyclopentadienyl cobalt cyclopentadiene.

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