公开(公告)号：US11035038B2

公开(公告)日：2021-06-15

申请号：US15766251

申请日：2016-10-06

Applicant: Entegris, Inc.

Inventor： Thomas H. Baum ,  Yuqi Li ,  David James Eldridge ,  Robert L. Wright

IPC: C09D1/00 ,  C23C16/448 ,  C04B35/00 ,  B22F3/02 ,  C04B35/515 ,  C04B35/63 ,  C04B35/634 ,  C09D5/00

Abstract: A solid delivery precursor is described, which is useful for volatilization to generate precursor vapor for a vapor deposition process. The solid delivery precursor comprises solid bodies of compacted particulate precursor, e.g., in a form such as pellets, platelets, tablets, beads, discs, or monoliths. When utilized in a vapor deposition process such as chemical vapor deposition, pulsed chemical vapor deposition, or atomic layer deposition, the solid delivery precursor in the form of solid bodies of compacted particulate precursor provide substantially increased flux of precursor vapor when subjected to volatilization conditions, in relation to the particulate precursor. As a result, vapor deposition process operation can be carried out in shorter periods of time, thereby achieving increased manufacturing rates of products such as semiconductor products, flat-panel displays, solar panels, LEDs, optical coatings, and the like.

公开(公告)号：US20180282863A1

公开(公告)日：2018-10-04

申请号：US15766251

申请日：2016-10-06

Applicant: Entegris, Inc.

Inventor： Thomas H. Baum ,  Yuqi Li ,  David James Eldridge ,  Robert L. Wright

IPC: C23C16/448 ,  B22F3/02 ,  C09D5/00 ,  C09D1/00 ,  C04B35/515 ,  C04B35/63 ,  C04B35/634

Abstract: A solid delivery precursor is described, which is useful for volatilization to generate precursor vapor for a vapor deposition process. The solid delivery precursor comprises solid bodies of compacted particulate precursor, e.g., in a form such as pellets, platelets, tablets, beads, discs, or monoliths. When utilized in a vapor deposition process such as chemical vapor deposition, pulsed chemical vapor deposition, or atomic layer deposition, the solid delivery precursor in the form of solid bodies of compacted particulate precursor provide substantially increased flux of precursor vapor when subjected to volatilization conditions, in relation to the particulate precursor. As a result, vapor deposition process operation can be carried out in shorter periods of time, thereby achieving increased manufacturing rates of plays, solar panels, LEDs, optical coatings, and the like.

公开(公告)号：US20170103888A1

公开(公告)日：2017-04-13

申请号：US15292760

申请日：2016-10-13

Applicant: Entegris, Inc.

Inventor： Dingkai Guo ,  Bryan C. Hendrix ,  Yuqi Li ,  Susan V. DiMeo ,  Weimin Li ,  William Hunks

IPC: H01L21/02 ,  C23C16/455 ,  C23C16/40

CPC classification number: H01L21/02211 ,  C23C16/402 ,  C23C16/45523 ,  C23C16/45534 ,  H01L21/02164 ,  H01L21/0228

Abstract: A precursor composition is described, useful for low temperature (