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公开(公告)号：US20240194437A1
公开(公告)日：2024-06-13
申请号：US18555466
申请日：2022-04-06
Applicant: Excillum AB
Inventor： Julius Hållstedt , Ulf Lundström , Per Takman
IPC: H01J35/18
CPC classification number: H01J35/18 , H01J2235/082 , H01J2235/18
Abstract: An X-ray source is provided comprising a target generator configured to generate a liquid jet having an elongated cross with a major axis and a minor axis; an electron source configured to generate an electron beam arranged to interact with the liquid jet in an interaction region to generate X-ray radiation; and an X-ray transparent window arranged to transmit X-ray radiation generated in the interaction region, wherein the X-ray transparent window is located for extraction of X-ray radiation at an angle α relative to the major axis; wherein the target generator is configured to generate the liquid jet such that said jet has a thickness at the interaction region, along a propagation direction of the electron beam, that is less than an electron penetration depth of the electron beam in the liquid jet. A corresponding method for generating X-ray radiation is also provided.
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公开(公告)号：US11800625B2
公开(公告)日：2023-10-24
申请号：US17290580
申请日：2019-11-04
Applicant: Excillum AB
Inventor： Johan Kronstedt , Ulf Lundström , Per Takman
IPC: H05G2/00
Abstract: X-ray sources including an electron source, an adjustment means for adjusting an orientation of the electron beam generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. Also, X-ray sources including a target orientation sensor and a target adjustment means, wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target.
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公开(公告)号：US11892576B2
公开(公告)日：2024-02-06
申请号：US18155314
申请日：2023-01-17
Applicant: Excillum AB
Inventor： Per Takman , Tomi Tuohimaa , Ulf Lundström
CPC classification number: G01T1/34 , H01J35/153 , H05G1/52 , H01J2235/082
Abstract: A method for characterizing an electron beam in a liquid metal jet X-ray source. The method includes providing the electron beam and directing the electron beam to an interaction region; providing an electron beam dump connected to ground potential for receiving the electron beam after it has traversed the interaction region; scanning the electron beam over at least part of the interaction region; measuring X-ray radiation generated by interaction between the electron beam and the electron beam dump during the scanning to obtain an X-ray profile; and calculating an electron beam characteristic based on the X-ray profile. Also, a corresponding liquid metal jet X-ray source.
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公开(公告)号：US11257651B2
公开(公告)日：2022-02-22
申请号：US16973497
申请日：2019-06-24
Applicant: Excillum AB
Inventor： Per Takman , Ulf Lundström , Björn Hansson
Abstract: A method in an X-ray source configured to emit, from an interaction region, X-ray radiation generated by an interaction between an electron beam and a target, the method including the steps of: providing the target; providing the electron beam; deflecting the electron beam along a first direction relative the target; detecting electrons indicative of the interaction between the electron beam and the target; determining a first extension of the electron beam on the target, along the first direction, based on the detected electrons and the deflection of the electron beam; detecting X-ray radiation generated by the interaction between the electron beam and the target; and determining a second extension of the electron beam on the target, along a second direction, based on the detected X-ray radiation.
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公开(公告)号：US12120807B2
公开(公告)日：2024-10-15
申请号：US18471588
申请日：2023-09-21
Applicant: Excillum AB
Inventor： Johan Kronstedt , Ulf Lundström , Per Takman
IPC: H05G2/00
Abstract: X-ray sources including an electron source, an adjustment means for adjusting an orientation of the electron beam generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. Also, X-ray sources including a target orientation sensor and a target adjustment means, wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target.
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Patent Agency Ranking
公开(公告)号：US11979972B2
公开(公告)日：2024-05-07
申请号：US17609655
申请日：2020-05-07
Applicant: Excillum AB
Inventor： Björn Hansson , Per Takman , Ulf Lundström , Tomi Tuohimaa
CPC classification number: H05G2/006 , F04B15/02 , F04B17/03 , F04B17/04 , H01J35/112 , H01J2235/082 , H01J2235/1026
Abstract: A liquid metal jet X-ray source including an electromagnetic pump for pumping the liquid metal. The electromagnetic pump includes a core having a core diameter and an outer yoke with a thickness of at least 20% of the core diameter. Preferably, the thickness of the outer yoke is at least 20% of the core diameter plus 6% of a radial distance between an outside of the core and an inside of the yoke.
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公开(公告)号：US11350512B2
公开(公告)日：2022-05-31
申请号：US17057192
申请日：2019-06-07
Applicant: Excillum AB
Inventor： Per Takman , Ulf Lundström
Abstract: A method for controlling an X-ray source configured to emit, from an X-ray spot on a target, X-ray radiation generated by an interaction between an electron beam and the target, wherein the X-ray spot is determined by the field of view of an X-ray optical system of the X-ray source. The method includes providing the target, providing the electron beam forming an electron spot on the target and interacting with the target to generate X-ray radiation, and adjusting a width and total power of the electron beam such that a maximum of the power density profile in the electron spot is below a predetermined limit, and such that a total power delivered to the target in the X-ray spot is increased.
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公开(公告)号：US10930464B2
公开(公告)日：2021-02-23
申请号：US16499582
申请日：2018-03-27
Applicant: Excillum AB
Inventor： Per Takman , Tomi Tuohimaa
Abstract: A method for generating X-ray radiation, the method including providing a liquid target in a chamber, directing an electron beam towards the liquid target such that the electron beam interacts with the liquid target to generated X-ray radiation, estimating a number of particles produced from the interaction between the electron beam and the liquid target by measuring a number of positively charged particles in the chamber and eliminating a contribution from scattered electrons to the estimated number of particles, and controlling the electron beam, and/or a temperature in a region of the liquid target in which the electron beam interacts with the target, such that the estimated number of particles is below a predetermined limit. Also, a corresponding X-ray source.
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公开(公告)号：US20250046560A1
公开(公告)日：2025-02-06
申请号：US18717615
申请日：2022-12-06
Applicant: Excillum AB
Inventor： Per Takman , Tomi Tuohimaa , Ulf Lundström
Abstract: There is provided an X-ray source comprising an electron source for providing an electron beam, the electron source comprising a cathode, a Wehnelt, and an anode; an electron optic arrangement configured to deflect and focus the electron beam towards a target for generation of X-ray radiation; an arrangement for determining a quantity indicative of a width of the electron beam; and a controller configured to compute a quantity dependent on a divergence of the electron beam at an entrance of the electron optic arrangement based on the quantity indicative of a width of the electron beam; and apply a bias voltage to the Wehnelt such that the quantity dependent on the divergence of the electron beam at the entrance of the electron optic arrangement is adjusted towards a desired value. A corresponding method is also provided.
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公开(公告)号：US11963286B2
公开(公告)日：2024-04-16
申请号：US17725152
申请日：2022-04-20
Applicant: Excillum AB
Inventor： Björn Hansson , Per Takman , Yuli Wang , Shiho Tanaka
CPC classification number: H05G2/006 , H01J35/08 , H01J35/14 , H01J35/153 , H01J2235/082
Abstract: An X-ray source including: a liquid target source configured to provide a liquid target moving along a flow axis; an electron source configured to provide an electron beam; and a liquid target shaper configured to shape the liquid target to include a non-circular cross section with respect to the flow axis, wherein the non-circular cross section has a first width along a first axis and a second width along a second axis, wherein the first width is shorter than the second width, and wherein the liquid target includes an impact portion being intersected by the first axis; wherein the x-ray source is configured to direct the electron beam towards the impact portion such that the electron beam interacts with the liquid target within the impact portion to generate X-ray radiation.
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