公开(公告)号：US20230341341A1

公开(公告)日：2023-10-26

申请号：US17728869

申请日：2022-04-25

Applicant: FEI COMPANY

Inventor： Daniel TOTONJIAN ,  Aurelien Philippe Jean Maclou BOTMAN ,  Milos TOTH

IPC: G01N23/2206 ,  G01N23/2257 ,  G01N23/203 ,  G01N23/2252

CPC classification number: G01N23/2206 ,  G01N23/2257 ,  G01N23/203 ,  G01N23/2252

Abstract: Practical implementation of Particle-Induced X-ray Emission (PIXE) on a focused ion beam apparatus or on a dual-beam apparatus comprising both focused-ion beam and scanning microscopy capabilities is described. Accordingly, an analytical method comprises: directing and focusing a beam of ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and detecting and measuring X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample.