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公开(公告)号:US11546974B2
公开(公告)日:2023-01-03
申请号:US17072337
申请日:2020-10-16
Applicant: FORMOSA TAFFETA CO., LTD.
Inventor: Fang-Jong Liu , Hsing-Nan Chung , Meng-Yueh Wu
IPC: H05K1/09 , H05K9/00 , H01M4/32 , H01M4/52 , H01M4/64 , H01M4/66 , H01M4/70 , H01M4/74 , H01M4/505 , H01M4/525 , H01M4/583 , H05B3/34 , H05K1/03 , H05K3/18
Abstract: The present invention provides a conductive fabric comprising base cloth and a conductive metallic circuit structure formed on the surface of the base cloth. The conductive metallic circuit structure comprises at least one metallic seed layer and at least one chemical-plating layer. The metallic seed layer is an evaporation-deposition layer or a sputter-deposition layer and has a circuit pattern. The chemical-plating layer is applied over the surface of the metallic seed layer. The conductive fabric has improved conductivity and heat generation efficiency.
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公开(公告)号:US20210120634A1
公开(公告)日:2021-04-22
申请号:US17072337
申请日:2020-10-16
Applicant: FORMOSA TAFFETA CO., LTD.
Inventor: Fang-Jong Liu , Hsing-Nan Chung , Meng-Yueh Wu
Abstract: The present invention provides a conductive fabric comprising base cloth and a conductive metallic circuit structure formed on the surface of the base cloth. The conductive metallic circuit structure comprises at least one metallic seed layer and at least one chemical-plating layer. The metallic seed layer is an evaporation-deposition layer or a sputter-deposition layer and has a circuit pattern. The chemical-plating layer is applied over the surface of the metallic seed layer. The conductive fabric has improved conductivity and heat generation efficiency.
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