公开(公告)号：US20230367210A1

公开(公告)日：2023-11-16

申请号：US18355269

申请日：2023-07-19

Applicant: FUJIFILM Corporation

Inventor： Tsutomu YOSHIMURA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Yuma KURUMISAWA

IPC: G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin that has a repeating unit which has an aromatic ring having a halogen atom or an organic group having a halogen atom, and having a halogen atom-free substituent; and (Y) an ionic compound having a halogen atom in a cationic moiety, in which a content of the ionic compound (Y) is 5.0% by mass or more with respect to a total solid content of the composition.

公开(公告)号：US20230375925A1

公开(公告)日：2023-11-23

申请号：US18356701

申请日：2023-07-21

Applicant: FUJIFILM Corporation

Inventor： Tsutomu YOSHIMURA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Yuma KURUMISAWA

IPC: G03F7/029

CPC classification number: G03F7/029

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin which has a repeating unit derived from a compound represented by Formula (1) as defined herein; and (B) a compound which generates an acid by irradiation with an actinic ray or a radiation. The present invention also provides an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, a method for manufacturing an electronic device, a compound and a resin.

公开(公告)号：US20230213861A1

公开(公告)日：2023-07-06

申请号：US18175870

申请日：2023-02-28

Applicant: FUJIFILM Corporation

Inventor： Takamitsu TOMIGA ,  Takumi TANAKA ,  Fumihiro YOSHINO ,  Yuma KURUMISAWA

IPC: G03F7/039 ,  G03F7/038

CPC classification number: G03F7/039 ,  G03F7/038

Abstract: A method for producing an actinic ray-sensitive or radiation-sensitive resin composition having a viscosity of 10 mPa·s or more, the method containing a step 1 of charging at least a resin of which polarity increases by an action of an acid, a photoacid generator, and a solvent as raw materials into a stirring tank, and a step 2 of stirring the raw materials in the stirring tank. A liquid temperature in the stirring tank is controlled to be equal to or lower than a 3.0° C. higher temperature than a liquid temperature at a start of the step 2 throughout the entire step 2, and the control of the liquid temperature in the stirring tank in the step 2 is performed by passing an inert gas through the stirring tank.

公开(公告)号：US20230099422A1

公开(公告)日：2023-03-30

申请号：US17902202

申请日：2022-09-02

Applicant: FUJIFILM Corporation

Inventor： Takumi TANAKA ,  Takashi BANNAI ,  Takamitsu TOMIGA ,  Kohei HIGASHI ,  Fumihiro YOSHINO ,  Yuma KURUMISAWA

IPC: G03F7/00 ,  G03F7/028

Abstract: A method for producing a composition, the method being for producing a composition using a stirring device provided with a stirring tank and a stirrer, includes a mixing step of charging a resin, an acid generator, and a solvent into the stirring tank, and a stirring step of stirring the mixture accommodated in the stirring tank, using the stirrer, in which a ratio c of a content of the acid generator to a total mass of the mixture is 0.3% to 2.5% by mass, the stirrer is provided with a rotatable stirring shaft, a plurality of support parts attached to the stirring shaft, and a plurality of stirring elements attached to each of end parts of the plurality of support parts, the shape and the arrangement of the stirring elements are specified, and the positions of the plurality of stirring elements are specified so as to satisfy a specific Expression (1).