公开(公告)号：US20130284949A1

公开(公告)日：2013-10-31

申请号：US13846852

申请日：2013-03-18

Applicant: GIGAPHOTON INC.

Inventor： Hiroshi KOMORI ,  Tatsuya YANAGIDA ,  Yoshifumi UENO ,  Akira SUMITANI ,  Akira ENDO ,  Tsukasa HORI

IPC: G21K5/00

CPC classification number: G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

Abstract translation: EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。 这减少了碎片的产生。 离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。 电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。 当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。

公开(公告)号：US20130126762A1

公开(公告)日：2013-05-23

申请号：US13742276

申请日：2013-01-15

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Hiroshi KOMORI ,  Takeshi ASAYAMA

IPC: H05G2/00

CPC classification number: H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultra violet light source apparatus in which debris moving within a chamber are prevented from reducing reflectance or transmittance of optical elements of an EUV collector mirror, etc, and extreme ultra violet light can stably be generated in a long period. The apparatus includes: a target supply unit for supplying a target to a predetermined position within a chamber; a driver laser for applying a laser beam to the target to generate first plasma; a collector mirror provided within the chamber, for collecting extreme ultra violet light radiated from the first plasma; a gas supply unit for supplying a gas into the chamber; an excitation unit for exciting the gas to generate second plasma around a region where the first plasma is generated; and an exhaust unit for exhausting the chamber and ejecting debris emitted from the first plasma to outside of the chamber.

Abstract translation: 能够防止在室内移动的碎屑减少EUV收集镜等的光学元件的反射率或透射率的极端紫外线光源装置，能够长时间稳定地产生极紫外光。 该装置包括：目标供给单元，用于将目标供给到室内的预定位置; 用于将激光束施加到所述靶以产生第一等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集从第一等离子体辐射的极紫外光; 气体供应单元，用于将气体供应到所述室中; 用于激发气体以在产生第一等离子体的区域周围产生第二等离子体的激励单元; 以及排气单元，用于排出室并将从第一等离子体发射的碎屑喷射到室外。

公开(公告)号：US20140021376A1

公开(公告)日：2014-01-23

申请号：US13935233

申请日：2013-07-03

Applicant: GIGAPHOTON INC.

Inventor： Hiroshi KOMORI ,  Yoshifumi UENO ,  Georg SOUMAGNE

IPC: G21K5/00

CPC classification number: G21K5/00 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.

Abstract translation: 激光产生等离子体的极紫外光源装置，其中可以有效地喷射从等离子体发射的离子等带电粒子。 极紫外光源装置包括：提供目标材料的目标喷嘴; 激光振荡器，其将激光束施加到从所述目标喷嘴供给的目标材料以产生等离子体; 收集从等离子体辐射的极紫外光的收集器光学元件; 以及在将激光束施加到目标材料的位置形成非对称磁场的磁场形成单元。