公开(公告)号：US09465290B2

公开(公告)日：2016-10-11

申请号：US14243238

申请日：2014-04-02

Applicant: GLOBALFOUNDRIES INC.

Inventor： Wu-Song Huang ,  Martin Glodde ,  Dario L. Goldfarb ,  Wai-Kin Li ,  Sen Liu ,  Libor Vyklicky

IPC: C09D5/32 ,  C09D163/00 ,  C08K5/00 ,  G03F7/038 ,  G03F7/09 ,  G03F7/11 ,  H01L51/44

CPC classification number: G03F7/0388 ,  G03F7/038 ,  G03F7/091 ,  G03F7/11 ,  H01L51/447

Abstract: A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.

Abstract translation: 一种可固化液体制剂，其包含：（i）一种或多种近红外吸收聚甲炔染料; （ii）一种或多种可交联聚合物; 和（iii）一种或多种浇铸溶剂。 本发明还涉及由可固化液体制剂的交联形式组成的固体近红外吸收膜。 本发明还涉及一种含有固体近红外线吸收膜的涂层的微电子衬底，以及在近红外吸收膜位于微电子衬底之间的情况下，用于图案化涂覆在微电子衬底上的光刻胶层的方法 和光刻胶膜。

公开(公告)号：US09235119B2

公开(公告)日：2016-01-12

申请号：US14457149

申请日：2014-08-12

Applicant: GLOBALFOUNDRIES INC.

Inventor： Kuang-Jung Chen ,  Wu-Song Huang ,  Ranee Wai-Ling Kwong ,  Sen Liu ,  Pushkara R. Varanasi

IPC: G03F7/20 ,  G03F7/038 ,  G03F7/004 ,  G03F7/039 ,  G03F7/095 ,  G03F7/30 ,  G03F7/38

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/095 ,  G03F7/20 ,  G03F7/2022 ,  G03F7/30 ,  G03F7/38 ,  G03F7/70466 ,  Y10S430/12

Abstract: A method that forms a film of photoresist composition on a substrate and exposes a first and second region of the film to radiation through a first and second mask having a first and second image pattern, respectively. The photoresist composition includes a polymer comprising at least one acid labile group, a photosensitive acid generator capable of generating a first amount of acid upon exposure to a first dose of radiation and of generating a second amount of acid upon exposure to a second dose of radiation, and a photosensitive base generator capable of generating a first amount of base upon exposure to the first dose of radiation and of generating a second amount of base upon exposure to the second dose of radiation. The photosensitive acid generator includes (trifluoro-methylsulfonyloxy)-bicyclo[2.2.1]hept-5-ene-2,3-dicarboximide (MDT), N-hydroxy-naphthalimide dodecane sulfonate (DDSN), or a combination thereof. The photosensitive base generator includes a quaternary ammonium salt.

Abstract translation: 一种在衬底上形成光致抗蚀剂组合物的膜并将膜的第一和第二区分别暴露于具有第一和第二图像图案的第一和第二掩模的辐射的方法。 光致抗蚀剂组合物包括包含至少一种酸不稳定基团的聚合物，当暴露于第一剂量的辐射时能够产生第一量的酸并且在暴露于第二剂量的辐射时产生第二量的酸的光敏酸产生剂 以及光敏基底产生器，其能够在暴露于第一剂量的辐射时产生第一量的碱，并且在暴露于第二剂量的辐射时产生第二量的碱。 光敏酸产生剂包括（三氟 - 甲基磺酰氧基） - 双环[2.2.1]庚-5-烯-2,3-二甲酰亚胺（MDT），N-羟基 - 萘二甲酰亚胺十二烷基磺酸盐（DDSN）或它们的组合。 感光基底发生器包括季铵盐。