公开(公告)号：US20180272648A1

公开(公告)日：2018-09-27

申请号：US15469098

申请日：2017-03-24

Applicant: GOODRICH CORPORATION

Inventor： Zhongfen Ding ,  Scott Alan Eastman ,  Michael Paul Humbert ,  Steven W. Gronda ,  Jacquelynn KM Garofano ,  Brian St. Rock ,  Christopher L. Chapman ,  Farzana Hussain

IPC: B32B3/26 ,  B32B7/12 ,  B32B15/04 ,  B32B9/00 ,  B32B27/06 ,  B32B21/14

CPC classification number: B32B3/266 ,  B32B7/12 ,  B32B9/007 ,  B32B15/04 ,  B32B21/14 ,  B32B27/06 ,  B32B2307/302 ,  B32B2307/3065 ,  B32B2607/00

Abstract: A veneer panel may comprise a face veneer, a thermally conductive layer, and a backing layer bonded to the thermally conductive layer. The thermally conductive layer may comprise a chemically treated thermally conductive layer. The chemically treated thermally conductive layer may comprise a plurality of first vinyl groups chemically bonded to a first surface of the chemically treated thermally conductive layer.

公开(公告)号：US09963779B2

公开(公告)日：2018-05-08

申请号：US15056358

申请日：2016-02-29

Applicant: Goodrich Corporation

Inventor： James Warren Rudolph ,  Ying She ,  Zissis A. Dardas ,  Thomas P. Filburn ,  Brian St. Rock ,  John Linck

IPC: C23C16/22 ,  C23C16/04 ,  C04B35/83

CPC classification number: C23C16/045 ,  C04B35/83 ,  C04B2235/77

Abstract: A process for densifying an annular porous structure comprising flowing a reactant gas into an inner diameter (ID) volume and through an ID surface of the annular porous structure, flowing the reactant gas through an outer diameter (OD) surface of the annular porous structure and into an OD volume, flowing the reactant gas from the OD volume through the OD surface of the annular porous structure, and flowing the reactant gas through an ID surface of the annular porous structure and into the ID volume.

公开(公告)号：US11584987B2

公开(公告)日：2023-02-21

申请号：US16927843

申请日：2020-07-13

Applicant: Goodrich Corporation

Inventor： Ying She ,  Brian St. Rock

IPC: C23C16/04 ,  C23C16/26 ,  C23C16/455 ,  C23C16/458 ,  C04B35/83 ,  C23C16/52 ,  F16D65/12

Abstract: A system and method for enhancing a diffusion limited CVI/CVD process is provided. The system may densify a porous structure by flowing a reactant gas around the porous structure. A mass flow controller may be configured to pulse the flow rate of the reactant gas around the porous structure. The mass flow controller may pulse the flow rate from a nominal flow rate to a first flow rate. The mass flow controller may pulse the first flow rate back to the nominal flow rate or to a second flow rate. The mass flow controller may pulse the flow rate between the nominal flow rate, the first flow rate, and the second flow rate, as desired.

公开(公告)号：US20220204184A1

公开(公告)日：2022-06-30

申请号：US17134981

申请日：2020-12-28

Applicant: Goodrich Corporation

Inventor： Mark Brian Dowty ,  Ethan Husmann ,  Brian St. Rock

IPC: B64F5/30 ,  A61L2/24 ,  A61L2/10

Abstract: Devices, systems, methods, and articles of manufacture for delivering disinfecting electromagnetic radiation to various areas, items, and components of a cabin of an aircraft are provided herein. For example, the disclosed disinfecting system may be configured to emit electromagnetic radiation to disinfect a stowable item, such as a personal item of a passenger or a component of the aircraft cabin. Generally, the devices, systems, methods, and articles of manufacture disclosed and described herein facilitate disinfection treatments, especially to items and/or components that would not be subjected to conventional aircraft cleaning treatments.

公开(公告)号：US20210363360A1

公开(公告)日：2021-11-25

申请号：US17327063

申请日：2021-05-21

Applicant: Goodrich Corporation

Inventor： Vijay V. Pujar ,  David Charles McConnell ,  Steven Poteet ,  Blair A. Smith ,  Claude J. Moreau ,  Thomas Martz ,  Brian St. Rock

IPC: C09D5/14 ,  A01N59/20 ,  C09D7/61 ,  C09D5/18

Abstract: A component is provided having a component body defining at least one touch point. The component body includes an antimicrobial material operable to deactivate a microbe arranged in contact with a surface of the touch point.

公开(公告)号：US11014330B2

公开(公告)日：2021-05-25

申请号：US15469098

申请日：2017-03-24

Applicant: GOODRICH CORPORATION

Inventor： Zhongfen Ding ,  Scott Alan Eastman ,  Michael Paul Humbert ,  Steven W. Gronda ,  Jacquelynn K M Garofano ,  Brian St. Rock ,  Christopher L. Chapman ,  Farzana Hussain

IPC: B32B3/26 ,  B32B7/12 ,  B32B15/04 ,  B32B9/00 ,  B32B27/06 ,  B32B21/14

Abstract: A veneer panel may comprise a face veneer, a thermally conductive layer, and a backing layer bonded to the thermally conductive layer. The thermally conductive layer may comprise a chemically treated thermally conductive layer. The chemically treated thermally conductive layer may comprise a plurality of first vinyl groups chemically bonded to a first surface of the chemically treated thermally conductive layer.

公开(公告)号：US20200340104A1

公开(公告)日：2020-10-29

申请号：US16927843

申请日：2020-07-13

Applicant: Goodrich Corporation

Inventor： Ying She ,  Brian St. Rock

IPC: C23C16/04 ,  C23C16/26 ,  C23C16/455 ,  C23C16/458 ,  C04B35/83 ,  C23C16/52 ,  F16D65/12

Abstract: A system and method for enhancing a diffusion limited CVI/CVD process is provided. The system may densify a porous structure by flowing a reactant gas around the porous structure. A mass flow controller may be configured to pulse the flow rate of the reactant gas around the porous structure. The mass flow controller may pulse the flow rate from a nominal flow rate to a first flow rate. The mass flow controller may pulse the first flow rate back to the nominal flow rate or to a second flow rate. The mass flow controller may pulse the flow rate between the nominal flow rate, the first flow rate, and the second flow rate, as desired.

公开(公告)号：US10752988B2

公开(公告)日：2020-08-25

申请号：US16164315

申请日：2018-10-18

Applicant: Goodrich Corporation

Inventor： Ying She ,  Brian St. Rock

IPC: C23C16/04 ,  C23C16/26 ,  C23C16/455 ,  C23C16/458 ,  C04B35/83 ,  C23C16/52 ,  F16D65/12

Abstract: A system and method for enhancing a diffusion limited CVI/CVD process is provided. The system may densify a porous structure by flowing a reactant gas around the porous structure. A mass flow controller may be configured to pulse the flow rate of the reactant gas around the porous structure. The mass flow controller may pulse the flow rate from a nominal flow rate to a first flow rate. The mass flow controller may pulse the first flow rate back to the nominal flow rate or to a second flow rate. The mass flow controller may pulse the flow rate between the nominal flow rate, the first flow rate, and the second flow rate, as desired.

公开(公告)号：US10465282B2

公开(公告)日：2019-11-05

申请号：US15941570

申请日：2018-03-30

Applicant: GOODRICH CORPORATION

Inventor： James Warren Rudolph ,  Ying She ,  Zissis A. Dardas ,  Thomas P. Filburn ,  Brian St. Rock ,  John Linck

IPC: C23C16/04 ,  C23C16/455 ,  C04B35/83 ,  C23C16/52

Abstract: A process for densifying an annular porous structure comprising flowing a reactant gas into an inner diameter (ID) volume and through an ID surface of the annular porous structure, flowing the reactant gas through an outer diameter (OD) surface of the annular porous structure and into an OD volume, flowing the reactant gas from the OD volume through the OD surface of the annular porous structure, and flowing the reactant gas through an ID surface of the annular porous structure and into the ID volume.

公开(公告)号：US20190048462A1

公开(公告)日：2019-02-14

申请号：US16164315

申请日：2018-10-18

Applicant: Goodrich Corporation

Inventor： Ying She ,  Brian St. Rock

IPC: C23C16/04 ,  F16D65/12 ,  C23C16/52 ,  C23C16/458 ,  C23C16/455 ,  C23C16/26 ,  C04B35/83

CPC classification number: C23C16/045 ,  C04B35/83 ,  C04B2235/614 ,  C23C16/26 ,  C23C16/45502 ,  C23C16/45523 ,  C23C16/4557 ,  C23C16/4581 ,  C23C16/4583 ,  C23C16/52 ,  F16D65/126

Abstract: A system and method for enhancing a diffusion limited CVI/CVD process is provided. The system may densify a porous structure by flowing a reactant gas around the porous structure. A mass flow controller may be configured to pulse the flow rate of the reactant gas around the porous structure. The mass flow controller may pulse the flow rate from a nominal flow rate to a first flow rate. The mass flow controller may pulse the first flow rate back to the nominal flow rate or to a second flow rate. The mass flow controller may pulse the flow rate between the nominal flow rate, the first flow rate, and the second flow rate, as desired.