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公开(公告)号：US20230278279A1
公开(公告)日：2023-09-07
申请号：US17684543
申请日：2022-03-02
Applicant: GOODRICH CORPORATION
Inventor： Sergey Mironets , Tod Policandriotes
IPC: B29C64/118 , B33Y10/00 , B33Y30/00 , B33Y40/10 , B29C64/209 , B29C64/314 , B29B7/90
CPC classification number: B29C64/118 , B33Y10/00 , B33Y30/00 , B33Y40/10 , B29C64/209 , B29C64/314 , B29B7/90 , B29K2105/12
Abstract: A composite component may be additively manufactured by a system that mixes a fiber and matrix and extrudes a body made of the fiber and matrix toward a work piece. The extruded body may be pressed against the work piece and the workpiece and/or extruded body may be moved relative to the other. The extruded body may at least partially melt and flow, uniting with the workpiece and additively manufacturing a layer of a feature thereon. In this manner, friction stir additive manufacturing of composite components having a fiber and matrix composite may be accomplished.
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2.发明申请公开(公告)号：US20200232092A1
公开(公告)日：2020-07-23
申请号：US16843605
申请日：2020-04-08
Applicant: GOODRICH CORPORATION
Inventor： Tod Policandriotes
Abstract: A system for chemical vapor infiltration and densification may comprise a reaction chamber and a plurality of conduits fluidly coupled to an exhaust outlet of the reaction chamber. A first set of conduits of the plurality of conduits may define a first flow path and a second set of conduits of the plurality of conduits may define a second flow path. The second flow path may be fluidly coupled to an inlet of the reaction chamber. A hydrogen extraction component may be in fluid communication with a least one of the first set of conduits or the second set of conduits.
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3.发明授权公开(公告)号：US10648075B2
公开(公告)日：2020-05-12
申请号：US15725620
申请日：2017-10-05
Applicant: GOODRICH CORPORATION
Inventor： Tod Policandriotes
Abstract: A system for chemical vapor infiltration and densification may comprise a reaction chamber and a plurality of conduits fluidly coupled to an exhaust outlet of the reaction chamber. A first set of conduits of the plurality of conduits may define a first flow path and a second set of conduits of the plurality of conduits may define a second flow path. The second flow path may be fluidly coupled to an inlet of the reaction chamber. A hydrogen extraction component may be in fluid communication with a least one of the first set of conduits or the second set of conduits.
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Patent Agency Ranking
公开(公告)号：US10683572B2
公开(公告)日：2020-06-16
申请号：US16160930
申请日：2018-10-15
Applicant: GOODRICH CORPORATION
Inventor： Gavin Charles Richards , Tod Policandriotes , Afshin Bazhushtari
IPC: C23C16/455 , C23C16/32 , C23C16/50
Abstract: A system for chemical vapor densification includes a reaction chamber having an inlet and outlet; a trap; a conduit fluidly coupled between the outlet of the reaction chamber and the trap; a cryogenic cooler fluidly coupled to the trap though a frustoconical conduit; a first exit path from the cryogenic cooler that vents hydrogen gas to an exhaust; and a second exit path from the cryogenic cooler that recirculates silane and hydrocarbon-rich gas back to the inlet of the reaction chamber—and a related method places a substrate in the reaction chamber; establishes a sub-atmospheric pressure inert gas atmosphere within the reaction chamber; densifies the substrate by inputting virgin gas into the reaction chamber; withdraws effluent gas from the reaction chamber; extracts silane and hydrocarbon-rich gas from the effluent gas; and recirculates the silane and hydrocarbon-rich gas back to the reaction chamber.
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5.发明申请公开(公告)号：US20200115799A1
公开(公告)日：2020-04-16
申请号：US16160930
申请日：2018-10-15
Applicant: GOODRICH CORPORATION
Inventor： Gavin Charles Richards , Tod Policandriotes , Afshin Bazhushtari
IPC: C23C16/455 , C23C16/32 , C23C16/50
Abstract: A system for chemical vapor densification includes a reaction chamber having an inlet and outlet; a trap; a conduit fluidly coupled between the outlet of the reaction chamber and the trap; a cryogenic cooler fluidly coupled to the trap though a frustoconical conduit; a first exit path from the cryogenic cooler that vents hydrogen gas to an exhaust; and a second exit path from the cryogenic cooler that recirculates silane and hydrocarbon-rich gas back to the inlet of the reaction chamber—and a related method places a substrate in the reaction chamber; establishes a sub-atmospheric pressure inert gas atmosphere within the reaction chamber; densifies the substrate by inputting virgin gas into the reaction chamber; withdraws effluent gas from the reaction chamber; extracts silane and hydrocarbon-rich gas from the effluent gas; and recirculates the silane and hydrocarbon-rich gas back to the reaction chamber.
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公开(公告)号：US11639545B2
公开(公告)日：2023-05-02
申请号：US16843605
申请日：2020-04-08
Applicant: GOODRICH CORPORATION
Inventor： Tod Policandriotes
Abstract: A method of chemical vapor infiltration and deposition includes disposing a porous substrate within a reaction chamber, establishing a sub-atmospheric pressure within the reaction chamber, introducing a hydrocarbon reaction gas into a reaction zone of the reaction chamber to densify the porous substrate, withdrawing unreacted hydrocarbon reaction gas from the reaction chamber, the unreacted hydrocarbon reaction gas comprising hydrocarbon molecules having six or more carbon atoms, removing at least a portion of the hydrocarbon molecules having six or more carbon molecules from the unreacted hydrocarbon reaction gas by causing the portion of the hydrocarbon molecules having six or more carbon atoms to condense, and recirculating at least a portion of the unreacted hydrocarbon reaction gas back into the reaction zone.
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公开(公告)号：US11255015B2
公开(公告)日：2022-02-22
申请号：US16868424
申请日：2020-05-06
Applicant: GOODRICH CORPORATION
Inventor： Gavin Charles Richards , Tod Policandriotes , Afshin Bazhushtari
IPC: C23C16/455 , C23C16/32 , C23C16/50
Abstract: A system for chemical vapor densification includes a reaction chamber having an inlet and outlet; a trap; a conduit fluidly coupled between the outlet of the reaction chamber and the trap; a cryogenic cooler fluidly coupled to the trap though a frustoconical conduit; a first exit path from the cryogenic cooler that vents hydrogen gas to an exhaust; and a second exit path from the cryogenic cooler that recirculates silane and hydrocarbon-rich gas back to the inlet of the reaction chamber—and a related method places a substrate in the reaction chamber; establishes a sub-atmospheric pressure inert gas atmosphere within the reaction chamber; densifies the substrate by inputting virgin gas into the reaction chamber; withdraws effluent gas from the reaction chamber; extracts silane and hydrocarbon-rich gas from the effluent gas; and recirculates the silane and hydrocarbon-rich gas back to the reaction chamber.
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8.发明申请公开(公告)号：US20200263302A1
公开(公告)日：2020-08-20
申请号：US16868424
申请日：2020-05-06
Applicant: GOODRICH CORPORATION
Inventor： Gavin Charles Richards , Tod Policandriotes , Afshin Bazhushtari
IPC: C23C16/455 , C23C16/50 , C23C16/32
Abstract: A system for chemical vapor densification includes a reaction chamber having an inlet and outlet; a trap; a conduit fluidly coupled between the outlet of the reaction chamber and the trap; a cryogenic cooler fluidly coupled to the trap though a frustoconical conduit; a first exit path from the cryogenic cooler that vents hydrogen gas to an exhaust; and a second exit path from the cryogenic cooler that recirculates silane and hydrocarbon-rich gas back to the inlet of the reaction chamber—and a related method places a substrate in the reaction chamber; establishes a sub-atmospheric pressure inert gas atmosphere within the reaction chamber; densifies the substrate by inputting virgin gas into the reaction chamber; withdraws effluent gas from the reaction chamber; extracts silane and hydrocarbon-rich gas from the effluent gas; and recirculates the silane and hydrocarbon-rich gas back to the reaction chamber.
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