公开(公告)号：US12005389B1

公开(公告)日：2024-06-11

申请号：US18479346

申请日：2023-10-02

Applicant: GlobalFoundries U.S. Inc.

Inventor： Justin Weinstein ,  Kimberly E. Konar

IPC: B01D53/04 ,  B01D53/40 ,  B01D53/82 ,  H01L21/67

CPC classification number: B01D53/0446 ,  B01D53/0423 ,  B01D53/40 ,  B01D53/82 ,  B01D2253/102 ,  B01D2258/0216 ,  B01D2259/4145 ,  H01L21/67017

Abstract: A system to abate an emission stream from a semiconductor manufacturing process is disclosed. The system includes a media canister to abate the emission stream in response to an abatement fault in an abatement apparatus. The media canister includes a reaction chamber configured to receive the emission stream in response to the abatement fault, and a dry media disposed within the reaction chamber to abate the emission stream. The dry media includes at least one reactive and/or absorbent material which catalyzes at least one chemical reaction to remove at least one pollutant from the emission stream and yield exhaust substantially free of the at least one pollutant.