公开(公告)号：US20240402589A1

公开(公告)日：2024-12-05

申请号：US18270178

申请日：2021-12-14

Applicant: HOYA CORPORATION

Inventor： Hideaki NARAHARA ,  Takashi UCHIDA

IPC: G03F1/60 ,  G03F1/24

Abstract: Provided is a substrate for mask blank, a substrate with multilayer reflective film, and a mask blank
The substrate for mask blank has two opposing main surfaces. In an inner region of a square having a side of 132 mm based on the center of the substrate, a synthetic surface profile is produced from surface profiles of the two main surfaces of the substrate, a relationship between spatial frequency fr[mm−1] and power spectral density Pr[μm2/(mm−1)] is calculated from the synthetic surface profile, and within the range of spatial frequency fr of 0.02 [mm−1] or more and 0.40 [mm−1] or less, a relationship Pr

公开(公告)号：US20220121109A1

公开(公告)日：2022-04-21

申请号：US17431702

申请日：2020-03-24

Applicant: HOYA CORPORATION

Inventor： Hideaki NARAHARA

IPC: G03F1/60 ,  G03F1/24

Abstract: Provided is a mask blank substrate whose surface shape as of the time after the substrate is set on a mask stage of an exposure apparatus can be accurately calculated.
A mask blank substrate 10 includes a first main surface 12a on which a transfer pattern is formed and a second main surface 12b that is opposed to the first main surface 12a and is to be electrostatically chucked to a mask stage of an exposure apparatus. The first main surface 12a includes a first area 20a located around the center and a second area 20b located outside the first area 20a. The second main surface 12b includes a third area 20c located around the center and a fourth area 20d located outside the third area 20c. The angle α formed between the least squares plane of the first area 20a and the least squares plane of the third area 20c is less than 1.2°. The PV value of a surface of each of the second area 20b and the fourth area 20d is 400 nm or less.