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公开(公告)号：US20240231216A1
公开(公告)日：2024-07-11
申请号：US18561499
申请日：2022-05-31
Applicant: HOYA CORPORATION
Inventor： Takuro ONO , Yohei IKEBE
IPC: G03F1/24
CPC classification number: G03F1/24
Abstract: A mask blank comprises a substrate with a multilayer reflective film and a pattern-forming thin film formed on a main surface of the substrate in this order. The thin film contains tantalum, molybdenum, and nitrogen. In the thin film, a ratio of a nitrogen content [atomic %] to a total content [atomic %] of tantalum and molybdenum is 0.15 or more.
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