公开(公告)号：US11097299B2

公开(公告)日：2021-08-24

申请号：US16264601

申请日：2019-01-31

Applicant: Hermes Epitek Corp.

Inventor： Yung-Min Pai ,  Pao-Chi Chi ,  Jih-Jenn Huang

IPC: B05B12/20 ,  B05B15/60

Abstract: A slurry spraying mask includes a holding portion and a mask portion. The holding portion includes a holding portion opening. The mask portion includes a first layer and a second layer. The first layer includes a first tapered structure, the second layer includes a second tapered structure. The first tapered structure and the second tapered structure are arranged coaxially. A gap exists between the first layer and the second layer. The apex of the first tapered structure includes a first aperture, the apex of the second tapered structure includes a second aperture, and the second aperture is overlapped with the first aperture. The apex of the second tapered structure passes through the holding portion opening such that the mask portion is localized to the holding portion.