公开(公告)号：US20040114142A1

公开(公告)日：2004-06-17

申请号：US10730583

申请日：2003-12-08

Applicant: Hinds Instruments, Inc.

Inventor： Baoliang Wang

IPC: G01J004/00

CPC classification number: G03F7/7085 ,  G01J4/04 ,  G01N21/19 ,  G01N21/23 ,  G01N21/33 ,  G03F7/70966

Abstract: Provided are systems and methods for precisely measuring birefringence properties of optical elements, especially those elements that are used in deep ultraviolet (DUV) wavelengths. The system includes two photoelastic modulators (PEM) (126, 128) located on opposite sides of the sample (136). Each PEM is operable for modulating the polarity of a light beam that passes though the sample. The system also includes a polarizer (124) associated with one PEM, an analyzer (130) associated with the other PEM, and a detector (132) for measuring the intensity of the light after it passes through the PEMs, polarizer, and analyzer. Described are techniques for determining birefringence properties across a wide range. For example, a dual-wavelength source light embodiment is provided for measuring relatively high levels of birefringence. Also provided is a technique for selecting the most accurate and efficient one of a number of approaches to determining birefringence properties depending upon the estimated value of the birefringence to be detected for a given sample optical element.

Abstract translation: 提供了用于精确测量光学元件的双折射性质的系统和方法，特别是用于深紫外（DUV）波长的那些元件。 该系统包括位于样品（136）的相对侧上的两个光弹性调制器（PEM）（126,128）。 每个PEM可操作用于调制通过样品的光束的极性。 该系统还包括与一个PEM相关联的偏振器（124），与另一个PEM相关联的分析器（130），以及用于在通过PEM，偏振器和分析器之后测量光的强度的检测器（132）。 描述了用于在宽范围内确定双折射性质的技术。 例如，提供双波长源光实施例用于测量相对高水平的双折射。 还提供了一种技术，用于根据对于给定的采样光学元件的待检测的双折射的估计值来选择确定双折射性质的多种方法中最精确和最有效的方法之一。

公开(公告)号：US20040156049A1

公开(公告)日：2004-08-12

申请号：US10364006

申请日：2003-02-10

Applicant: Hinds Instruments, Inc.

Inventor： Andrew H. Breninger ,  Christopher O. Griffiths ,  Douglas C. Mark ,  Artemiy Mikheyev ,  Baoliang Wang

IPC: G02B001/00 ,  G01J004/00

CPC classification number: G02B27/0006 ,  G01J1/02 ,  G01J1/0252 ,  G01N21/23 ,  G03F7/70933

Abstract: Purging of a light beam path in an effective manner that minimizes the affect of the purging requirement on system throughput. In one embodiment, the invention is incorporated into a birefringence measurement system that has several components for directing light through a sample optical element and thereafter detecting and analyzing the light. The segment of the beam path through the sample is isolated to reduce the volume that requires continual purging.

Abstract translation: 以有效的方式清除光束路径，以最大限度地减少净化需求对系统吞吐量的影响。 在一个实施例中，本发明被并入双折射测量系统中，该系统具有多个用于将光引导通过样品光学元件的组件，然后检测和分析光。 通过样品的光束路径的段被隔离以减少需要连续吹扫的体积。