公开(公告)号：US20200314995A1

公开(公告)日：2020-10-01

申请号：US16667909

申请日：2019-10-30

Applicant: Huazhong University of Science and Technology

Inventor： Jiang HUANG ,  Lige ZHANG ,  Mingwu FAN ,  Tiaoqin YU ,  Haijun LI ,  Zhou DING ,  Chen ZUO ,  Jun YANG ,  Yongqian XIONG ,  Wei QI ,  Long ZHAO ,  Lei CAO ,  Tongning HU

IPC: H05H7/04 ,  H01F7/02

Abstract: A system of electron irradiation includes an electron accelerator and an electron beam focusing device. The electron accelerator emits and accelerates a beam of electrons. The electron beam focusing device is located at a rear end of the electron irradiation and includes a beam restraining rail and 2n+1 sets of magnetic poles. The beam restraining rail forms a beam restraining channel through which the beam of electrons are to pass. The 2n+1 sets of magnetic poles are installed on the beam restraining rail and distributed at different locations of the beam restraining channel. An nth set of magnetic poles thereof are arranged for performing, on the beam of electrons, focusing in a first direction. An (n+1)th set of magnetic poles thereof are arranged for performing, on the beam of electrons, focusing in a second direction. The second direction is perpendicular to the first direction. The n is a positive integer.