SEMICONDUCTOR MOUNTING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR MOUNTING DEVICE
    2.
    发明申请
    SEMICONDUCTOR MOUNTING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR MOUNTING DEVICE 审中-公开
    半导体安装装置及制造半导体安装装置的方法

    公开(公告)号:US20140113414A1

    公开(公告)日:2014-04-24

    申请号:US14141927

    申请日:2013-12-27

    Abstract: A semiconductor mounting device including a first substrate having first insulation layers, first conductor layers formed on the first insulation layers and via conductors connecting the first conductor layers, a second substrate having a core substrate, second conductor layers, through-hole conductors and buildup layers having second insulation layers and third conductor layers, first bumps connecting the first and second substrates and formed on the outermost first conductor layer on the outermost first insulation layer, and second bumps positioned to connect a semiconductor element and formed on the outermost third conductor layer on the outermost second insulation layer. The second substrate has greater thickness than the first substrate, the second conductor layers are formed on surfaces of the core substrate, respectively, the through-hole conductors are formed through the core substrate and connecting the second conductor layers, and the buildup layers are formed on the core substrate and second conductor layers, respectively.

    Abstract translation: 一种半导体安装装置,包括具有第一绝缘层的第一基板,形成在第一绝缘层上的第一导体层和连接第一导体层的通孔导体,具有芯基板的第二基板,第二导体层,通孔导体和积层 具有第二绝缘层和第三导体层,第一凸块连接第一和第二基板并形成在最外部第一绝缘层上的最外面的第一导体层上,以及第二凸起,其被定位成连接半导体元件并形成在最外面的第三导体层上 最外层的第二绝缘层。 第二基板具有比第一基板更大的厚度,第二导体层分别形成在芯基板的表面上,通孔导体分别通过芯基板形成并连接第二导体层,并且形成积层 分别在芯基板和第二导体层上。

    METHOD FOR MANUFACTURING WIRING SUBSTRATE

    公开(公告)号:US20230069980A1

    公开(公告)日:2023-03-09

    申请号:US17822883

    申请日:2022-08-29

    Abstract: A method for manufacturing a wiring substrate includes forming a resin insulating layer on a first conductor layer such that the resin insulating layer covers the first conductor layer, applying a roughening treatment on a surface of the resin insulating layer on the opposite side with respect to the first conductor layer, forming an opening in the resin insulating layer after the roughening treatment on the surface of the resin insulating layer such that the opening penetrates through the resin insulating layer and exposes a portion of the first conductor layer, and forming a second conductor layer on the surface of the resin insulating layer such that the second conductor layer is formed in contact with the surface of the resin insulating layer and that a via conductor is formed in the opening of the resin insulating layer.

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