公开(公告)号：US20240426654A1

公开(公告)日：2024-12-26

申请号：US18368000

申请日：2023-09-13

Applicant: II-VI Delaware, Inc.

Inventor： Daniel Labahn ,  Danny Chan ,  Patrick Kuhl ,  Romon Chakrabarti ,  Andreas Ziemann ,  Hannes Noack

IPC: G01J1/42 ,  G01J1/04

Abstract: The disclosure relates to a system and method for monitoring a high power laser beam in a laser material processing optical system, and provides a device and method for monitoring a high power laser beam. According to the present disclosure a detailed determination of properties of a high-power laser beam takes place in the direction of an optical fiber or laser beam entering a laser processing head connected to the laser source and these measurements can be performed during the processing operation. The device according to the present disclosure has optical sensors for measuring the intensity and respective current laser power.

公开(公告)号：US20240082961A1

公开(公告)日：2024-03-14

申请号：US18368414

申请日：2023-09-14

Applicant: II-VI Delaware, Inc.

Inventor： Daniel Labahn ,  Danny Chan ,  Patrick Kuhl ,  Romon Chakrabarti ,  Andreas Ziemann ,  Hannes Noack

IPC: B23K26/70 ,  B23K26/06

CPC classification number: B23K26/707 ,  B23K26/0643 ,  B23K26/0648

Abstract: The disclosure relates to a system and a method for monitoring the state of optical elements of a device for laser material processing. According to the present disclosure a detailed monitoring of the state of optical elements of a device for laser material processing takes place by monitoring properties of laser radiation in the direction of an optical fiber or laser radiation entering a laser processing head connected to the laser source and these measurements, which can be performed during the processing process. The device according to the present disclosure has optical sensors for measuring the intensity and respective current laser power.