公开(公告)号：US20160018687A1

公开(公告)日：2016-01-21

申请号：US14493173

申请日：2014-09-22

Applicant: INNOLUX CORPORATION

Inventor： Yueh-Ting CHUNG ,  Jyun-Yu CHEN ,  Shao Wu HSU ,  Yung-Hsin LU ,  Chao Hsiang WANG ,  Kuan Yu CHIU

IPC: G02F1/1362 ,  H01L27/12 ,  G02F1/1343

CPC classification number: G02F1/136227 ,  G02F1/1343 ,  G02F1/1362 ,  G02F1/136286 ,  G02F2001/133357 ,  G02F2201/40 ,  H01L27/1222 ,  H01L27/1225 ,  H01L27/124

Abstract: An element substrate is provided, including a substrate, a metal layer and a planarization layer. The metal layer is located on the substrate. The metal layer has a first edge in a first direction. The planarization layer is located on the metal layer. The planarization layer includes a contact hole. The contact hole has a contiguous wall and a bottom side. The metal layer is exposed in the bottom side. A contour line of the contiguous wall on a vertical plane is a curved line. The first edge corresponds vertically with a critical point on the contour line. The slope of a tangent line on the critical point of the contour line is smaller than 0.176.

Abstract translation: 提供元件基板，包括基板，金属层和平坦化层。 金属层位于基板上。 金属层具有沿第一方向的第一边缘。 平坦化层位于金属层上。 平坦化层包括接触孔。 接触孔具有连续的壁和底侧。 金属层暴露在底面。 垂直平面上连续壁的轮廓线是曲线。 第一个边沿垂直对应于轮廓线上的临界点。 轮廓线临界点上切线的斜率小于0.176。