Method for processing a substrate and a method of process screening for integrated circuits
    1.
    发明授权
    Method for processing a substrate and a method of process screening for integrated circuits 有权
    用于处理基板的方法和集成电路的工艺筛选方法

    公开(公告)号:US09406572B2

    公开(公告)日:2016-08-02

    申请号:US14527811

    申请日:2014-10-30

    Abstract: According to various embodiments, a method for processing a substrate may include: forming a dielectric layer over the substrate, the dielectric layer may include a plurality of test regions; forming an electrically conductive layer over the dielectric layer to contact the dielectric layer in the plurality of test regions; simultaneously electrically examining the dielectric layer in the plurality of test regions, wherein portions of the electrically conductive layer contacting the dielectric layer in the plurality of test regions are electrically conductively connected with each other by an electrically conductive material; and separating the electrically conductive layer into portions of the electrically conductive layer contacting the dielectric layer in the plurality of test regions from each other.

    Abstract translation: 根据各种实施例,用于处理衬底的方法可以包括:在衬底上形成电介质层,电介质层可以包括多个测试区域; 在所述电介质层上形成导电层以接触所述多个测试区域中的介电层; 同时对多个测试区域中的电介质层进行电学检查,其中与多个测试区域中的电介质层接触的导电层的部分通过导电材料彼此导电连接; 以及将所述导电层分离成所述多个测试区域中与所述电介质层接触的所述导电层的部分。

    METHOD FOR PROCESSING A SUBSTRATE AND A METHOD OF PROCESS SCREENING FOR INTEGRATED CIRCUITS
    2.
    发明申请
    METHOD FOR PROCESSING A SUBSTRATE AND A METHOD OF PROCESS SCREENING FOR INTEGRATED CIRCUITS 有权
    用于处理基板的方法和用于集成电路的处理筛选方法

    公开(公告)号:US20160126149A1

    公开(公告)日:2016-05-05

    申请号:US14527811

    申请日:2014-10-30

    Abstract: According to various embodiments, a method for processing a substrate may include: forming a dielectric layer over the substrate, the dielectric layer may include a plurality of test regions; forming an electrically conductive layer over the dielectric layer to contact the dielectric layer in the plurality of test regions; simultaneously electrically examining the dielectric layer in the plurality of test regions, wherein portions of the electrically conductive layer contacting the dielectric layer in the plurality of test regions are electrically conductively connected with each other by an electrically conductive material; and separating the electrically conductive layer into portions of the electrically conductive layer contacting the dielectric layer in the plurality of test regions from each other.

    Abstract translation: 根据各种实施例,用于处理衬底的方法可以包括:在衬底上形成电介质层,电介质层可以包括多个测试区域; 在所述电介质层上形成导电层以接触所述多个测试区域中的介电层; 同时对多个测试区域中的电介质层进行电学检查,其中与多个测试区域中的电介质层接触的导电层的部分通过导电材料彼此导电连接; 以及将所述导电层分离成所述多个测试区域中与所述电介质层接触的所述导电层的部分。

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