公开(公告)号：US20200064738A1

公开(公告)日：2020-02-27

申请号：US16111056

申请日：2018-08-23

Applicant: Intel Corporation

Inventor： Changhua LIU ,  Allan KETELSEN

IPC: G03F7/20 ,  H01L21/027

Abstract: Embodiments disclosed herein include a lithographic patterning system and methods of using such a system to form a microelectronic device. In an embodiment, the lithographic patterning system includes an actinic radiation source, a stage where a major surface of the stage is for supporting a substrate with a resist layer, and a first prism over the stage, where the first prism comprises a first face that is substantially parallel to the major surface of the stage. In an embodiment, the lithographic patterning system further comprises a second prism, where the second prism comprises a first surface that is substantially parallel to a second surface of the first prism, and where a second surface of the second prism has a reflective coating.