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1.Die-stacking using through-silicon vias on bumpless build-up layer substrates including embedded-dice, and processes of forming same 有权
Title translation: 在包括嵌入骰子的无扰性积聚层基底上使用硅通孔进行芯片堆叠,以及其形成工艺公开(公告)号:US09406618B2
公开(公告)日:2016-08-02
申请号:US14305439
申请日:2014-06-16
Applicant: Intel Corporation
Inventor: John S. Guzek , Ravi K. Nalla , Javier Solo Gonzalez , Drew Delaney , Suresh Pothukuchi , Mohit Mamodia , Edward Zarbock , Johanna M. Swan
IPC: H01L23/538 , H01L23/498 , H01L23/48 , H01L23/00 , H01L25/03 , H01L25/065 , H01L25/18
CPC classification number: H01L23/5384 , H01L23/481 , H01L23/49816 , H01L23/49827 , H01L23/5389 , H01L24/24 , H01L24/48 , H01L24/73 , H01L24/82 , H01L25/03 , H01L25/0657 , H01L25/18 , H01L2224/16145 , H01L2224/16225 , H01L2224/24226 , H01L2224/48137 , H01L2224/48472 , H01L2224/73259 , H01L2225/06513 , H01L2225/06541 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01029 , H01L2924/01033 , H01L2924/01057 , H01L2924/014 , H01L2924/14 , H01L2924/15174 , H01L2924/15311 , H01L2924/00 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
Abstract: An apparatus includes a coreless substrate with a through-silicon via (TSV) embedded die that is integral to the coreless substrate. The apparatus includes a subsequent die that is coupled to the TSV die and that is disposed above the coreless substrate.
Abstract translation: 一种装置包括具有与无芯基板成一体的贯通硅通孔(TSV)嵌入管芯的无芯基板。 该设备包括连接到TSV管芯并且设置在无芯基板之上的后续管芯。