APPARATUS, SYSTEM AND METHOD FOR PROVIDING A MANUFACTURING GRIPPING NOZZLE

    公开(公告)号:US20230075432A1

    公开(公告)日:2023-03-09

    申请号:US17800440

    申请日:2020-02-17

    Applicant: JABIL INC.

    Inventor: JEROEN BOSBOOM

    Abstract: An apparatus, system and method for providing a manufacturing gripping nozzle. The apparatus, system and method for gripping an in-process component during processing may include: a chuck; at least two walls extending from the chuck; at least two peripheral guides having a size and shape correspondent to a periphery of the component and placed atop the at least two walls distal from the chuck, wherein the at least two peripheral guides are capable of positionally maintaining the periphery during the processing; and at least one Bernoulli cup within a cavity bounded by the chuck, the at least two walls, and the component, wherein the at least one Bernoulli cup non-contactedly grips the component.

    APPARATUS, SYSTEM AND METHOD FOR CLAMPING COMPONENTS

    公开(公告)号:US20230257215A1

    公开(公告)日:2023-08-17

    申请号:US18012842

    申请日:2021-06-25

    Applicant: JABIL INC.

    CPC classification number: B65G47/907

    Abstract: An apparatus, system and method for providing a clamping system for a part associated with a pallet. The apparatus, system and method may include: two opposing jaws on the pallet, each comprising a gripper for gripping the part, and a jaw base. The jaw base may include: gearing that synchronizes actuation of the opposing jaws; and a roller distal from the gripper. The part-clamp may also include: a centering spring that compresses to put pressure against the other of the opposing jaws; and a cam off the pallet, comprising a cam shaft that drives a cam face into the rollers to actuate the two grippers.

    APPARATUS, SYSTEM AND METHOD FOR PROVIDING A FLIPPER FOR IN-PROCESS SUBSTRATES

    公开(公告)号:US20230133493A1

    公开(公告)日:2023-05-04

    申请号:US17797640

    申请日:2021-02-12

    Applicant: JABIL INC.

    Inventor: JEROEN BOSBOOM

    Abstract: An apparatus, system and method for a substrate flipper capable of accommodating substrates of varying sizes. The apparatus, system and method may include a base housing providing at least a portion of a rotating feature; an arm enclosure rotatably associated with the rotating feature and providing at least one arm actuator, and at least one gripper actuator; two arms at two substantially distal points with respect to one another along the arm enclosure, each of the two arms being communicatively associated with the at least one arm actuator; and a gripper associated with each of the two arms distal from the arm enclosure, communicatively associated with the at least one gripper actuator and capable of gripping one of the substrates upon actuation of the gripper. The actuation of the at least one arm actuator effectuates a change in distance between central longitudinal axes of each of the two arms.

    APPARATUS, SYSTEM AND METHOD FOR PROVIDING SELF EXTRACTING GRIPS FOR AN END EFFECTOR

    公开(公告)号:US20230139939A1

    公开(公告)日:2023-05-04

    申请号:US17800522

    申请日:2020-02-17

    Applicant: JABIL INC.

    Abstract: An apparatus, system and method for a wedge clamp suitable to provide self extracting grips for an end effector suitable to hold semiconductor wafers, or other substrates such as rectangular panels. The apparatus, system and method may include two inner jaws at least mechanically associated with a robotic base; two outer arms associated with the inner jaws via at least one arms cam; and a plurality of wedge clamps. Each of the wedge clamps may comprise: a spring; a cam loaded on the spring; and a cam travel path into which the cam is slidably associated. A contraction of the inner jaws and a consequent arms camming of the outer arms applies pressure to a circumferential edge of the semiconductor wafer such that the circumferential edge depresses each of the cams along its respective cam travel path and against its respective one of the springs. The jaws close may synchronously about a center point of the substrate, thereby keeping it centered.

    APPARATUS, SYSTEM AND METHOD FOR PROVIDING A SUBSTRATE CHUCK

    公开(公告)号:US20230070848A1

    公开(公告)日:2023-03-09

    申请号:US17798654

    申请日:2021-02-15

    Applicant: JABIL INC.

    Inventor: JEROEN BOSBOOM

    Abstract: An apparatus, system and method for providing a stationary chuck for positionally maintaining an associated inprocess wafer. The stationary chuck may include a base plate having, on an upper surface thereof, a plurality of machined concentric ridges that form a series of concentric circular zones; a silicon carbide coating on the upper surface of the base plate; and a plurality of silicon carbide inlays capable of being bonded onto the silicon carbide coating in the concentric circular zones.

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