COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCTION OF COMPOUND, AND POLYMER
    1.
    发明申请
    COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCTION OF COMPOUND, AND POLYMER 有权
    组合物,电阻形成方法,化合物,化合物的制备方法和聚合物

    公开(公告)号:US20140248563A1

    公开(公告)日:2014-09-04

    申请号:US14273608

    申请日:2014-05-09

    Abstract: A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R2 represents a single bond or a divalent organic group having 1 to 20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. RQ represents a perfluoroalkyl group having 1 to 5 carbon atoms. RX represents a hydrogen atom or a monovalent base-labile group.

    Abstract translation: 组合物包括包含具有由下式(1)表示的第一结构单元的第一聚合物和溶剂的聚合物组分。 式(1)中,R 1表示氢原子或碳原子数1〜20的1价有机基团。 R2表示单键或碳原子数为1〜20的二价有机基团。 R3表示氢原子或碳原子数1〜20的1价有机基团。 RQ表示碳原子数1〜5的全氟烷基。 RX表示氢原子或一价碱基不稳定基团。

    COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND
    2.
    发明申请
    COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND 有权
    用于形成液体浸渍上层膜的组合物,抗蚀剂图案形成方法,聚合物和化合物

    公开(公告)号:US20140093826A1

    公开(公告)日:2014-04-03

    申请号:US14032528

    申请日:2013-09-20

    Abstract: A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R1 represents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 represents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof —CO—, —COO—, —O—, —NR′—, —CS—, —S—, —SO—, —SO2— or a combination thereof; and R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.

    Abstract translation: 用于形成液浸上层膜的组合物包括含有具有由式(1)表示的结构单元的聚合物的聚合物组分; 和溶剂。 R1表示羧基或由式(2)表示的基团。 X表示单键,碳原子数1〜20的二价烃基或碳原子数1〜20的二价氟代烃基。 R 2表示碳原子数1〜20的烃基,(n + 1)的化合价,碳原子数1〜20的氟代烃基,(n + 1)的化合价, -CO - , - CO-, - O - , - NR' - , - S-,-S - , - SO - , - SO 2 - 或其组合的两个碳原子; R3表示氢原子或碳原子数1〜20的1价有机基团。

    COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER
    3.
    发明申请
    COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER 有权
    用于形成液体浸渍上层膜的组合物和聚合物

    公开(公告)号:US20130217850A1

    公开(公告)日:2013-08-22

    申请号:US13852194

    申请日:2013-03-28

    Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).

    Abstract translation: 浸渍上层成膜组合物包括[A]包含聚合物(A1)的聚合物组分和[B]溶剂,包含结构单元(I)的聚合物(A1)包括由下列 式(i)。 结构单元(I)优选为由下式(1)表示的结构单元(I-1)。 聚合物组分[A]优选还包括由下式(2)表示的结构单元(II-1),包含在聚合物(A1)中的结构单元(II-1)或除聚合物 A1)。 聚合物组分[A]优选还包括包含羧基的结构单元(III),包含在聚合物(A1)中的结构单元(III)或聚合物(A1)以外的聚合物。

    COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM AND METHOD FOR FORMING RESIST PATTERN
    5.
    发明申请
    COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM AND METHOD FOR FORMING RESIST PATTERN 审中-公开
    用于形成液体浸渍上层膜的组合物和形成耐蚀图案的方法

    公开(公告)号:US20130084524A1

    公开(公告)日:2013-04-04

    申请号:US13630263

    申请日:2012-09-28

    CPC classification number: G03F7/0046 G03F7/11 G03F7/2041

    Abstract: A composition for forming a liquid immersion upper layer film, includes a first polymer, a second polymer and a solvent. The first polymer includes a first structural unit having a group represented by a following formula (i). In the formula (i), n is an integer of 1 to 3, and R1 represents a hydrocarbon group having a valency of (n+1) and having 1 to 20 carbon atoms. The second polymer is different from the first polymer. —R1OH)n  (i)

    Abstract translation: 一种用于形成液浸上层膜的组合物,包括第一聚合物,第二聚合物和溶剂。 第一聚合物包括具有由下式(i)表示的基团的第一结构单元。 式(i)中,n为1〜3的整数,R1表示碳原子数为1〜20的化合价的(n + 1)的烃基。 第二聚合物不同于第一聚合物。 -R1OHOH)n(i)

    METHOD OF FORMING PHOTORESIST PATTERN
    6.
    发明申请
    METHOD OF FORMING PHOTORESIST PATTERN 审中-公开
    形成光电子图案的方法

    公开(公告)号:US20140147794A1

    公开(公告)日:2014-05-29

    申请号:US14170659

    申请日:2014-02-03

    CPC classification number: G03F7/038 G03F7/11 G03F7/2041

    Abstract: A method of forming a photoresist pattern includes providing a photoresist film on a substrate. An upper layer film is provided on the photoresist film using an upper layer film-forming composition. Radiation is applied to the upper layer film and the photoresist film through a mask having a given pattern via an immersion medium. The upper layer film and the photoresist film are developed using a developer to form a photoresist pattern. The upper layer film-forming composition includes a resin soluble in the developer and a solvent component. The solvent component includes a first solvent, a second solvent shown by a general formula (2), and a third solvent shown by a general formula (3). The first solvent is diethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol diethyl ether, γ-butyrolactone, methyl propylene diglycol, methyl propylene triglycol or a mixture thereof. R—OH  (2) R1—O—R2  (3)

    Abstract translation: 形成光致抗蚀剂图案的方法包括在基底上提供光致抗蚀剂膜。 使用上层成膜组合物在光致抗蚀剂膜上设置上层膜。 通过浸渍介质通过具有给定图案的掩模将辐射施加到上层膜和光致抗蚀剂膜上。 使用显影剂显影上层膜和光致抗蚀剂膜以形成光致抗蚀剂图案。 上层成膜组合物包括可溶于显影剂的树脂和溶剂组分。 溶剂组分包括第一溶剂,由通式(2)表示的第二溶剂和由通式(3)表示的第三溶剂。 第一溶剂是二乙二醇单乙醚乙酸酯,乙二醇单丁醚乙酸酯,二甘醇二乙醚,γ-丁内酯,甲基丙二
    醇二丙烯,甲基丙烯三甘醇或其混合物。 R-OH(2)R1-O-R2(3)

    COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER
    7.
    发明申请
    COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER 审中-公开
    用于形成液体浸渍上层膜的组合物和聚合物

    公开(公告)号:US20170073541A1

    公开(公告)日:2017-03-16

    申请号:US15358250

    申请日:2016-11-22

    Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).

    Abstract translation: 浸渍上层成膜组合物包括[A]包含聚合物(A1)的聚合物组分和[B]溶剂,包含结构单元(I)的聚合物(A1)包括由下列 式(i)。 结构单元(I)优选为由下式(1)表示的结构单元(I-1)。 聚合物组分[A]优选还包括由下式(2)表示的结构单元(II-1),包含在聚合物(A1)中的结构单元(II-1)或除聚合物 A1)。 聚合物组分[A]优选还包括包含羧基的结构单元(III),包含在聚合物(A1)中的结构单元(III)或聚合物(A1)以外的聚合物。

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