公开(公告)号：US20070181834A1

公开(公告)日：2007-08-09

申请号：US11622241

申请日：2007-01-11

Applicant: JUERGEN KLEINSCHMIDT

Inventor： JUERGEN KLEINSCHMIDT

IPC: G01J3/10

CPC classification number: G01J1/08 ,  B82Y10/00 ,  G01J1/04 ,  G01J1/0414 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/7005 ,  G03F7/70166 ,  G03F7/70208

Abstract: The invention is directed to an arrangement and a method for the generation of EUV radiation of high average output, preferably for the wavelength region of 13.5 nm for use in semiconductor lithography. It is the object of the invention to find a novel possibility for generating EUV radiation of high average output which permits a time-multiplexing of the radiation of a plurality of source modules in a simple manner without overloading the source modules and without requiring extremely high rotational speeds of optical-mechanical components. This object is met, according to the invention, in that a plurality of identically constructed source modules which are arranged so as to be distributed around a common optical axis are directed to a rotatably mounted reflector arrangement which successively couples in the beam bundles of the source modules along the optical axis. The reflector arrangement has a drive unit by which a reflecting optical element is adjustable so as to be stopped temporarily in angular positions that are defined for the source modules and is oriented to the next source module in intervals between two exposure fields of a wafer by means of control signals emitted by an exposure system.

Abstract translation: 本发明涉及一种用于产生高平均输出的EUV辐射的装置和方法，优选用于半导体光刻中用于13.5nm的波长区域。 本发明的目的是找到一种产生高平均输出的EUV辐射的新颖可能性，其允许以简单的方式对多个源模块的辐射进行时间复用，而不会使源模块过载，而不需要极高的旋转 光学机械部件的速度。 根据本发明，满足本发明的目的在于，将多个相同构造的源模块布置成围绕公共光轴分布，被引导到可旋转地安装的反射器装置，该反射器装置在源的束束中连续耦合 模块沿光轴。 反射器装置具有驱动单元，反射光学元件可以通过该驱动单元被调节，以便临时停止在为源模块定义的角位置中，并且以晶片的两个曝光场之间的间隔定向到下一个源模块 由曝光系统发射的控制信号。