公开(公告)号：US20230175983A1

公开(公告)日：2023-06-08

申请号：US17730116

申请日：2022-04-26

Applicant: KLA CORPORATION

Inventor： Andrew CROSS ,  Kaushik SAH ,  Martin PLIHAL

IPC: G01N21/95 ,  G06T7/00 ,  G03F7/20

CPC classification number: G01N21/9505 ,  G06T7/0006 ,  G03F7/7065 ,  G03F7/70641 ,  G06T2207/30148 ,  G01N2201/061

Abstract: Process window qualification (PWQ) layouts can be used to determine a presence of a pattern anomaly associated with the pattern, patterning process, or patterning apparatus. For example, a modulated die or field can be compared to a slightly lower offset modulated die or field. In another example, the high to low corners for a particular condition or combination of conditions are compared. In yet another example, process modulation parameters can be used to estimate criticality of particular weak points of interest.