Methods and systems for optical surface defect material characterization

    公开(公告)号:US11703460B2

    公开(公告)日:2023-07-18

    申请号:US16913396

    申请日:2020-06-26

    CPC classification number: G01N21/9505 G01N21/45 G01N2201/064 G01N2201/06113

    Abstract: Methods and systems for detecting and classifying defects based on the phase of dark field scattering from a sample are described herein. In some embodiments, throughput is increased by detecting and classifying defects with the same optical system. In one aspect, a defect is classified based on the measured relative phase of scattered light collected from at least two spatially distinct locations in the collection pupil. The phase difference, if any, between the light transmitted through any two spatially distinct locations at the pupil plane is determined from the positions of the interference fringes in the imaging plane. The measured phase difference is indicative of the material composition of the measured sample. In another aspect, an inspection system includes a programmable pupil aperture device configured to sample the pupil at different, programmable locations in the collection pupil.

    Methods And Systems For Optical Surface Defect Material Characterization

    公开(公告)号:US20210010949A1

    公开(公告)日:2021-01-14

    申请号:US16913396

    申请日:2020-06-26

    Abstract: Methods and systems for detecting and classifying defects based on the phase of dark field scattering from a sample are described herein. In some embodiments, throughput is increased by detecting and classifying defects with the same optical system. In one aspect, a defect is classified based on the measured relative phase of scattered light collected from at least two spatially distinct locations in the collection pupil. The phase difference, if any, between the light transmitted through any two spatially distinct locations at the pupil plane is determined from the positions of the interference fringes in the imaging plane. The measured phase difference is indicative of the material composition of the measured sample. In another aspect, an inspection system includes a programmable pupil aperture device configured to sample the pupil at different, programmable locations in the collection pupil.

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