公开(公告)号：US20230138279A1

公开(公告)日：2023-05-04

申请号：US17977308

申请日：2022-10-31

Applicant: KOREA AEROSPACE RESEARCH INSTITUTE

Inventor： Bo Young Lee ,  Ok Chul Jung ,  Myeong Shin Lee

IPC: H01P11/00 ,  H01P1/20 ,  G06F30/373

Abstract: A filter manufacturing method and a filter manufactured by the filter manufacturing method are disclosed. The filter manufacturing method includes designating a use mode in a resonator to a first resonance mode, in response to designating to the first resonance mode, setting a band selected from a designated first frequency band to a passband in the resonator, switching the use mode in the resonator from the first resonance mode to a second resonator mode, in response to switching to the second resonance mode, setting a band selected from the first frequency band except for the passband to a stopband in the resonator, and manufacturing a primary filter including the resonator to which the passband and the stopband are set.