公开(公告)号：US12276912B2

公开(公告)日：2025-04-15

申请号：US17384200

申请日：2021-07-23

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Seung Sang Hwang ,  Soon Man Hong ,  Kyung Youl Baek ,  Chong Min Koo ,  Albert Lee ,  Seon Joon Kim ,  You Mee Choi

IPC: G03F7/075 ,  C08G77/04 ,  C08G77/18 ,  C08G77/20 ,  C08G77/28 ,  H01B3/30

Abstract: The present disclosure relates to a UV- and heat-curable ladder-like polysilsesquioxane copolymer and a method for preparing the same. Since a controlled functionality can be provided only on a desired region via a thiol-ene click reaction without an additional additive, an insulating layer having a low dielectric constant and a microcircuit pattern can be formed without an additional etching process.

公开(公告)号：US20220372231A1

公开(公告)日：2022-11-24

申请号：US17384200

申请日：2021-07-23

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Seung Sang HWANG ,  Soon Man Hong ,  Kyung Youl Baek ,  Chong Min Koo ,  Albert Lee ,  Seon Joon Kim ,  You Mee Choi

IPC: C08G77/04 ,  C08G77/28 ,  G03F7/075 ,  H01B3/30

Abstract: The present disclosure relates to a UV- and heat-curable ladder-like polysilsesquioxane copolymer and a method for preparing the same. Since a controlled functionality can be provided only on a desired region via a thiol-ene click reaction without an additional additive, an insulating layer having a low dielectric constant and a microcircuit pattern can be formed without an additional etching process.