INTERLOCKING CHEMICAL MECHANICAL POLISHING SYSTEM
    1.
    发明申请
    INTERLOCKING CHEMICAL MECHANICAL POLISHING SYSTEM 审中-公开
    互锁化学机械抛光系统

    公开(公告)号:US20020185467A1

    公开(公告)日:2002-12-12

    申请号:US10202053

    申请日:2002-07-23

    CPC classification number: B24B37/26 B24B21/04 B24B47/00

    Abstract: An interlocking polishing belt apparatus is disclosed. The interlocking polishing belt apparatus includes an interlocking belt, which includes a plurality of studs each having an upper stud end and a lower stud end. In addition, the interlocking polishing belt apparatus includes a polishing belt that is in contact with the interlocking belt. The polishing belt has a plurality of polishing belt stud holes, each configured to interlock with an upper stud end.

    Abstract translation: 公开了一种互锁的抛光带装置。 互锁抛光带装置包括互锁带,其包括多个螺柱,每个螺柱具有上螺柱端部和下螺柱端部。 此外,互锁抛光带装置包括与互锁带接触的研磨带。 抛光带具有多个抛光带螺栓孔,每个抛光带螺栓孔被构造成与上螺柱端部互锁。

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